Amorphous hydrogenated carbon films deposited by PECVD: influence of the substrate temperature on film growth and microstruture (2003)
- Authors:
- Autor USP: ZANATTA, ANTONIO RICARDO - IFSC
- Unidade: IFSC
- Assunto: FILMES FINOS
- Language: Inglês
- Imprenta:
- Source:
- Título: Abstract Book and Final Program
- Conference titles: International Conference on Amorphous and Microcrystalline Semiconductors : Science and Technology - ICAMS
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ABNT
CAPOTE, G et al. Amorphous hydrogenated carbon films deposited by PECVD: influence of the substrate temperature on film growth and microstruture. 2003, Anais.. Campinas: Instituto de Física de São Carlos, Universidade de São Paulo, 2003. . Acesso em: 14 nov. 2024. -
APA
Capote, G., Prioli, R., Jardim, P. M., Zanatta, A. R., Jacobsohn, L. G., & Freire Junior, F. L. (2003). Amorphous hydrogenated carbon films deposited by PECVD: influence of the substrate temperature on film growth and microstruture. In Abstract Book and Final Program. Campinas: Instituto de Física de São Carlos, Universidade de São Paulo. -
NLM
Capote G, Prioli R, Jardim PM, Zanatta AR, Jacobsohn LG, Freire Junior FL. Amorphous hydrogenated carbon films deposited by PECVD: influence of the substrate temperature on film growth and microstruture. Abstract Book and Final Program. 2003 ;[citado 2024 nov. 14 ] -
Vancouver
Capote G, Prioli R, Jardim PM, Zanatta AR, Jacobsohn LG, Freire Junior FL. Amorphous hydrogenated carbon films deposited by PECVD: influence of the substrate temperature on film growth and microstruture. Abstract Book and Final Program. 2003 ;[citado 2024 nov. 14 ] - Structural investigation of cobalt oxide films grown by reactive DC magnetron sputtering
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