Phosphorus implantation on near stoichiometric a-SIC:H films (2002)
Source: Microelectronics Technology and Devices SBMICRO 2002. Unidade: EP
Assunto: MICROELETRÔNICA
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ABNT
OLIVEIRA, A. R. e PAEZ CARREÑO, Marcelo Nelson. Phosphorus implantation on near stoichiometric a-SIC:H films. Microelectronics Technology and Devices SBMICRO 2002. Tradução . Pennington: The Electrochemical Society, 2002. . . Acesso em: 16 nov. 2025.APA
Oliveira, A. R., & Paez Carreño, M. N. (2002). Phosphorus implantation on near stoichiometric a-SIC:H films. In Microelectronics Technology and Devices SBMICRO 2002. Pennington: The Electrochemical Society.NLM
Oliveira AR, Paez Carreño MN. Phosphorus implantation on near stoichiometric a-SIC:H films. In: Microelectronics Technology and Devices SBMICRO 2002. Pennington: The Electrochemical Society; 2002. [citado 2025 nov. 16 ]Vancouver
Oliveira AR, Paez Carreño MN. Phosphorus implantation on near stoichiometric a-SIC:H films. In: Microelectronics Technology and Devices SBMICRO 2002. Pennington: The Electrochemical Society; 2002. [citado 2025 nov. 16 ]

