Diluted HNO3/HF as a final pre-oxidation cleaning step for MOS devices (2002)
Nogueira, Willian Aurélio; Toquetti, Leandro Zeidan; Santos Filho, Sebastião Gomes dos 
Fonte: Microelectronics Technology and Devices SBMICRO 2002. Unidade: EP
Assunto: MICROELETRÔNICA
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NOGUEIRA, Willian Aurélio e TOQUETTI, Leandro Zeidan e SANTOS FILHO, Sebastião Gomes dos. Diluted HNO3/HF as a final pre-oxidation cleaning step for MOS devices. Microelectronics Technology and Devices SBMICRO 2002. Tradução . Pennington: The Electrochemical Society, 2002. . . Acesso em: 16 nov. 2025.APA
Nogueira, W. A., Toquetti, L. Z., & Santos Filho, S. G. dos. (2002). Diluted HNO3/HF as a final pre-oxidation cleaning step for MOS devices. In Microelectronics Technology and Devices SBMICRO 2002. Pennington: The Electrochemical Society.NLM
Nogueira WA, Toquetti LZ, Santos Filho SG dos. Diluted HNO3/HF as a final pre-oxidation cleaning step for MOS devices. In: Microelectronics Technology and Devices SBMICRO 2002. Pennington: The Electrochemical Society; 2002. [citado 2025 nov. 16 ]Vancouver
Nogueira WA, Toquetti LZ, Santos Filho SG dos. Diluted HNO3/HF as a final pre-oxidation cleaning step for MOS devices. In: Microelectronics Technology and Devices SBMICRO 2002. Pennington: The Electrochemical Society; 2002. [citado 2025 nov. 16 ]
