One mask step a-Si:H/a-SiOxNy thin film transistor (2004)
Albertin, Katia Franklin 
; Pereyra, Inés
Source: Microelectronics technology and devices SBMicro 2004. Proceedings, v. 2004-03. Conference titles: Symposium on Microelectronics Technology and Devices SBMICRO. Unidade: EP
Subjects: MICROELETRÔNICA, CAPACITORES, FILMES FINOS
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ABNT
ALBERTIN, Katia Franklin e PEREYRA, Inés. One mask step a-Si:H/a-SiOxNy thin film transistor. 2004, Anais.. Pennington: The Electrochemical Society, 2004. . Acesso em: 18 nov. 2025.APA
Albertin, K. F., & Pereyra, I. (2004). One mask step a-Si:H/a-SiOxNy thin film transistor. In Microelectronics technology and devices SBMicro 2004. Proceedings, v. 2004-03. Pennington: The Electrochemical Society.NLM
Albertin KF, Pereyra I. One mask step a-Si:H/a-SiOxNy thin film transistor. Microelectronics technology and devices SBMicro 2004. Proceedings, v. 2004-03. 2004 ;[citado 2025 nov. 18 ]Vancouver
Albertin KF, Pereyra I. One mask step a-Si:H/a-SiOxNy thin film transistor. Microelectronics technology and devices SBMicro 2004. Proceedings, v. 2004-03. 2004 ;[citado 2025 nov. 18 ]
