Fonte: Microelectronics technology and devices SBMicro 2004. Proceedings, v. 2004-03. Nome do evento: International Symposium on Microelectronics Technology and Devices SBMICRO. Unidade: EP
Assuntos: MICROELETRÔNICA, FILMES FINOS
ABNT
MANSANO, Ronaldo Domingues et al. The influence of additives on electrical characteristics of DLC films deposited by reactive sputtering. 2004, Anais.. Pennington: The Electrochemical Society, 2004. . Acesso em: 15 nov. 2025.APA
Mansano, R. D., Mousinho, A. P., Zambom, L. da S., Medeiros, M. S. de, Verdonck, P. B., Guerino, M., & Massi, M. (2004). The influence of additives on electrical characteristics of DLC films deposited by reactive sputtering. In Microelectronics technology and devices SBMicro 2004. Proceedings, v. 2004-03. Pennington: The Electrochemical Society.NLM
Mansano RD, Mousinho AP, Zambom L da S, Medeiros MS de, Verdonck PB, Guerino M, Massi M. The influence of additives on electrical characteristics of DLC films deposited by reactive sputtering. Microelectronics technology and devices SBMicro 2004. Proceedings, v. 2004-03. 2004 ;[citado 2025 nov. 15 ]Vancouver
Mansano RD, Mousinho AP, Zambom L da S, Medeiros MS de, Verdonck PB, Guerino M, Massi M. The influence of additives on electrical characteristics of DLC films deposited by reactive sputtering. Microelectronics technology and devices SBMicro 2004. Proceedings, v. 2004-03. 2004 ;[citado 2025 nov. 15 ]
