Source: SBMicro 2000 : proceedings. Conference titles: International Conference on Microelectronics and Packaging. Unidade: EP
Assunto: CIRCUITOS INTEGRADOS
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NAVIA, Alan Rodrigo et al. Electrical characterization of thin nickel films obtained from electroless plating onto aluminum gate of MOS capacitors. 2000, Anais.. Manaus: SBMicro/UA/UFRGS/UNICAMP/USP, 2000. . Acesso em: 16 nov. 2025.APA
Navia, A. R., Sonnenberg, V., Marques, A. E. B., Santos Filho, S. G. dos, & Martino, J. A. (2000). Electrical characterization of thin nickel films obtained from electroless plating onto aluminum gate of MOS capacitors. In SBMicro 2000 : proceedings. Manaus: SBMicro/UA/UFRGS/UNICAMP/USP.NLM
Navia AR, Sonnenberg V, Marques AEB, Santos Filho SG dos, Martino JA. Electrical characterization of thin nickel films obtained from electroless plating onto aluminum gate of MOS capacitors. SBMicro 2000 : proceedings. 2000 ;[citado 2025 nov. 16 ]Vancouver
Navia AR, Sonnenberg V, Marques AEB, Santos Filho SG dos, Martino JA. Electrical characterization of thin nickel films obtained from electroless plating onto aluminum gate of MOS capacitors. SBMicro 2000 : proceedings. 2000 ;[citado 2025 nov. 16 ]
