RF electrical measurements in plasma processing reactors (2000)
Fonte: SBMicro 2000: proceedings. Nome do evento: International Conference on Microelectronics and Packaging. Unidade: EP
Assunto: CIRCUITOS INTEGRADOS
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PISANI, Marcelo B. e VERDONCK, Patrick Bernard. RF electrical measurements in plasma processing reactors. 2000, Anais.. Manaus: SBMicro/UA/UFRGS/UNICAMP/USP, 2000. . Acesso em: 16 nov. 2025.APA
Pisani, M. B., & Verdonck, P. B. (2000). RF electrical measurements in plasma processing reactors. In SBMicro 2000: proceedings. Manaus: SBMicro/UA/UFRGS/UNICAMP/USP.NLM
Pisani MB, Verdonck PB. RF electrical measurements in plasma processing reactors. SBMicro 2000: proceedings. 2000 ;[citado 2025 nov. 16 ]Vancouver
Pisani MB, Verdonck PB. RF electrical measurements in plasma processing reactors. SBMicro 2000: proceedings. 2000 ;[citado 2025 nov. 16 ]
