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Filtros : "Journal of Applied Polymer Science" "FOTOQUÍMICA" Limpar

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  • Artigo de periodico

    Photodegradation of poly(ethyleneoxide)/montmorillonite composite films (2013)

    Lombardo, Patricia Coelho; Poli, Alessandra Lima; Neumann, Miguel Guillermo; Machado, Douglas Silva; Cavalheiro, Carla Cristina Schmitt

    Source: Journal of Applied Polymer Science. Unidade: IQSC

    Assunto: FOTOQUÍMICA

    PrivadoAcesso à fonteDOIHow to cite
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    • ABNT

      LOMBARDO, Patricia Coelho et al. Photodegradation of poly(ethyleneoxide)/montmorillonite composite films. Journal of Applied Polymer Science, v. 127, n. 5, p. 3687-3692, 2013Tradução . . Disponível em: https://doi.org/10.1002/app.37987. Acesso em: 13 nov. 2025.

    • APA

      Lombardo, P. C., Poli, A. L., Neumann, M. G., Machado, D. S., & Cavalheiro, C. C. S. (2013). Photodegradation of poly(ethyleneoxide)/montmorillonite composite films. Journal of Applied Polymer Science, 127( 5), 3687-3692. doi:10.1002/app.37987

    • NLM

      Lombardo PC, Poli AL, Neumann MG, Machado DS, Cavalheiro CCS. Photodegradation of poly(ethyleneoxide)/montmorillonite composite films [Internet]. Journal of Applied Polymer Science. 2013 ; 127( 5): 3687-3692.[citado 2025 nov. 13 ] Available from: https://doi.org/10.1002/app.37987

    • Vancouver

      Lombardo PC, Poli AL, Neumann MG, Machado DS, Cavalheiro CCS. Photodegradation of poly(ethyleneoxide)/montmorillonite composite films [Internet]. Journal of Applied Polymer Science. 2013 ; 127( 5): 3687-3692.[citado 2025 nov. 13 ] Available from: https://doi.org/10.1002/app.37987

  • Artigo de periodico

    Thioxanthone sensitized photodegradation of poly(alkyl methacrylate) films (2010)

    Neumann, Miguel Guillermo; Cavalheiro, Carla Cristina Schmitt ; Goi, Beatriz Eleutério

    Source: Journal of Applied Polymer Science. Unidade: IQSC

    Assunto: FOTOQUÍMICA

    Acesso à fonteAcesso à fonteDOIHow to cite
    A citação é gerada automaticamente e pode não estar totalmente de acordo com as normas

    • ABNT

      NEUMANN, Miguel Guillermo e CAVALHEIRO, Carla Cristina Schmitt e GOI, Beatriz Eleutério. Thioxanthone sensitized photodegradation of poly(alkyl methacrylate) films. Journal of Applied Polymer Science, v. 115, n. 3, p. 1283-1288, 2010Tradução . . Disponível em: https://doi.org/10.1002/app.30758. Acesso em: 13 nov. 2025.

    • APA

      Neumann, M. G., Cavalheiro, C. C. S., & Goi, B. E. (2010). Thioxanthone sensitized photodegradation of poly(alkyl methacrylate) films. Journal of Applied Polymer Science, 115( 3), 1283-1288. doi:10.1002/app.30758

    • NLM

      Neumann MG, Cavalheiro CCS, Goi BE. Thioxanthone sensitized photodegradation of poly(alkyl methacrylate) films [Internet]. Journal of Applied Polymer Science. 2010 ; 115( 3): 1283-1288.[citado 2025 nov. 13 ] Available from: https://doi.org/10.1002/app.30758

    • Vancouver

      Neumann MG, Cavalheiro CCS, Goi BE. Thioxanthone sensitized photodegradation of poly(alkyl methacrylate) films [Internet]. Journal of Applied Polymer Science. 2010 ; 115( 3): 1283-1288.[citado 2025 nov. 13 ] Available from: https://doi.org/10.1002/app.30758
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