Thioxanthone sensitized photodegradation of poly(alkyl methacrylate) films (2010)
- Authors:
- USP affiliated authors: NEUMANN, MIGUEL GUILLERMO - IQSC ; CAVALHEIRO, CARLA CRISTINA SCHMITT - IQSC
- Unidade: IQSC
- DOI: 10.1002/app.30758
- Assunto: FOTOQUÍMICA
- Language: Inglês
- Imprenta:
- Source:
- Título: Journal of Applied Polymer Science
- ISSN: 0021-8995
- Volume/Número/Paginação/Ano: v. 115, n. 3, p. 1283-1288, 2010
- Este periódico é de acesso aberto
- Este artigo NÃO é de acesso aberto
-
ABNT
NEUMANN, Miguel Guillermo e CAVALHEIRO, Carla Cristina Schmitt e GOI, Beatriz Eleutério. Thioxanthone sensitized photodegradation of poly(alkyl methacrylate) films. Journal of Applied Polymer Science, v. 115, n. 3, p. 1283-1288, 2010Tradução . . Disponível em: https://doi.org/10.1002/app.30758. Acesso em: 06 fev. 2026. -
APA
Neumann, M. G., Cavalheiro, C. C. S., & Goi, B. E. (2010). Thioxanthone sensitized photodegradation of poly(alkyl methacrylate) films. Journal of Applied Polymer Science, 115( 3), 1283-1288. doi:10.1002/app.30758 -
NLM
Neumann MG, Cavalheiro CCS, Goi BE. Thioxanthone sensitized photodegradation of poly(alkyl methacrylate) films [Internet]. Journal of Applied Polymer Science. 2010 ; 115( 3): 1283-1288.[citado 2026 fev. 06 ] Available from: https://doi.org/10.1002/app.30758 -
Vancouver
Neumann MG, Cavalheiro CCS, Goi BE. Thioxanthone sensitized photodegradation of poly(alkyl methacrylate) films [Internet]. Journal of Applied Polymer Science. 2010 ; 115( 3): 1283-1288.[citado 2026 fev. 06 ] Available from: https://doi.org/10.1002/app.30758 - The mechanism of the photoinitiation of methyl methacrylate polymerization by the neutral red/triethylamine system
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- Polymeric photosensitizers based on thioxanthone: photodegradation study of poly(alkylmethacrylates)
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- The photoinitiation of MMA polymerization in the presence of iron complexes
- Efeito da concentração de QTX na cinética de fotodegradação de PSS
- The effect of using mixed initiator systems on the efficiency of photopolymerization of dental resins
Informações sobre o DOI: 10.1002/app.30758 (Fonte: oaDOI API)
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