Subjects: ÓPTICA ELETRÔNICA, MICROELETRÔNICA
ABNT
GONÇALVES NETO, Luiz et al. Full complex amplitude modulation proximity printing mask fabricated on DLC and SiO2 subtrates. 2002, Anais.. Tucson: Optical Society of America, 2002. Disponível em: https://repositorio.usp.br/directbitstream/4b6cc313-ccfe-483d-970c-72a3b35395cb/ok1281986.pdf. Acesso em: 27 nov. 2025.APA
Gonçalves Neto, L., Cirino, G. A., Mansano, R. D., Cardona, P. S. P., & Verdonck, P. B. (2002). Full complex amplitude modulation proximity printing mask fabricated on DLC and SiO2 subtrates. In . Tucson: Optical Society of America. Recuperado de https://repositorio.usp.br/directbitstream/4b6cc313-ccfe-483d-970c-72a3b35395cb/ok1281986.pdfNLM
Gonçalves Neto L, Cirino GA, Mansano RD, Cardona PSP, Verdonck PB. Full complex amplitude modulation proximity printing mask fabricated on DLC and SiO2 subtrates [Internet]. 2002 ;[citado 2025 nov. 27 ] Available from: https://repositorio.usp.br/directbitstream/4b6cc313-ccfe-483d-970c-72a3b35395cb/ok1281986.pdfVancouver
Gonçalves Neto L, Cirino GA, Mansano RD, Cardona PSP, Verdonck PB. Full complex amplitude modulation proximity printing mask fabricated on DLC and SiO2 subtrates [Internet]. 2002 ;[citado 2025 nov. 27 ] Available from: https://repositorio.usp.br/directbitstream/4b6cc313-ccfe-483d-970c-72a3b35395cb/ok1281986.pdf

