Full complex amplitude modulation proximity printing mask fabricated on DLC and SiO2 subtrates (2002)
- Authors:
- USP affiliated authors: GONCALVES NETO, LUIZ - EESC ; VERDONCK, PATRICK BERNARD - EP
- Unidades: EESC; EP
- Subjects: ÓPTICA ELETRÔNICA; MICROELETRÔNICA
- Language: Inglês
- Imprenta:
- Publisher: Optical Society of America
- Publisher place: Tucson
- Date published: 2002
- Conference titles: Diffractive Optics and Micro-Optics
-
ABNT
GONÇALVES NETO, Luiz et al. Full complex amplitude modulation proximity printing mask fabricated on DLC and SiO2 subtrates. 2002, Anais.. Tucson: Optical Society of America, 2002. Disponível em: https://repositorio.usp.br/directbitstream/4b6cc313-ccfe-483d-970c-72a3b35395cb/ok1281986.pdf. Acesso em: 29 dez. 2025. -
APA
Gonçalves Neto, L., Cirino, G. A., Mansano, R. D., Cardona, P. S. P., & Verdonck, P. B. (2002). Full complex amplitude modulation proximity printing mask fabricated on DLC and SiO2 subtrates. In . Tucson: Optical Society of America. Recuperado de https://repositorio.usp.br/directbitstream/4b6cc313-ccfe-483d-970c-72a3b35395cb/ok1281986.pdf -
NLM
Gonçalves Neto L, Cirino GA, Mansano RD, Cardona PSP, Verdonck PB. Full complex amplitude modulation proximity printing mask fabricated on DLC and SiO2 subtrates [Internet]. 2002 ;[citado 2025 dez. 29 ] Available from: https://repositorio.usp.br/directbitstream/4b6cc313-ccfe-483d-970c-72a3b35395cb/ok1281986.pdf -
Vancouver
Gonçalves Neto L, Cirino GA, Mansano RD, Cardona PSP, Verdonck PB. Full complex amplitude modulation proximity printing mask fabricated on DLC and SiO2 subtrates [Internet]. 2002 ;[citado 2025 dez. 29 ] Available from: https://repositorio.usp.br/directbitstream/4b6cc313-ccfe-483d-970c-72a3b35395cb/ok1281986.pdf - Design and fabrication of a hybrid diffractive optical device for multiple-line generation over a wide angle
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- Optical characterization of an amorphous-hydrogenated carbon film and its application in phase modulated diffractive optical elements
- Hybrid phase and amplitude modulation proximity printing mask fabricated on DLC and 'SIO IND. 2' substrates
- Implementation of Fresnel full complex-amplitude digital holograms
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- Fabrication of PMMA microlenses using a micromachined silicon moud
- Design, fabrication, and characterization of a full complex-amplitude modulation diffractive optical element
- Design of continuous full complex modulation proximity printing masks using a quadratic phase distribution
- Laser enhanced polymer etching in different ambients
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