Improved retention times in UTBOX nMOSFETs for 1T-DRAM applications (2014)
Sasaki, Karen Lucia Mayumi; Nicoletti, Talitha; Almeida, L M; Santos, Sara Dereste dos; Nissimoff, Albert; Aoulaiche, Marc; Martino, João Antonio 
Source: Solid-State Electronics. Unidade: EP
Assunto: TRANSISTORES
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SASAKI, Karen Lucia Mayumi et al. Improved retention times in UTBOX nMOSFETs for 1T-DRAM applications. Solid-State Electronics, v. 97, p. 30-37, 2014Tradução . . Disponível em: https://doi.org/10.1016/j.sse.2014.04.031. Acesso em: 14 set. 2024.APA
Sasaki, K. L. M., Nicoletti, T., Almeida, L. M., Santos, S. D. dos, Nissimoff, A., Aoulaiche, M., & Martino, J. A. (2014). Improved retention times in UTBOX nMOSFETs for 1T-DRAM applications. Solid-State Electronics, 97, 30-37. doi:10.1016/j.sse.2014.04.031NLM
Sasaki KLM, Nicoletti T, Almeida LM, Santos SD dos, Nissimoff A, Aoulaiche M, Martino JA. Improved retention times in UTBOX nMOSFETs for 1T-DRAM applications [Internet]. Solid-State Electronics. 2014 ;97 30-37.[citado 2024 set. 14 ] Available from: https://doi.org/10.1016/j.sse.2014.04.031Vancouver
Sasaki KLM, Nicoletti T, Almeida LM, Santos SD dos, Nissimoff A, Aoulaiche M, Martino JA. Improved retention times in UTBOX nMOSFETs for 1T-DRAM applications [Internet]. Solid-State Electronics. 2014 ;97 30-37.[citado 2024 set. 14 ] Available from: https://doi.org/10.1016/j.sse.2014.04.031
