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Filtros : "Journal of Applied Physics" "IME" Limpar

Filtros

Artigo de periodico
Optimization techniques for the estimation of the thickness and the optical parameters of thin films using reflectance data (2005)
Ventura, S. D.; Birgin, Ernesto Julian Goldberg ; Martinez, Jesus Manuel; Chambouleyron, Ivan Emílio
Fonte: Journal of Applied Physics. Unidade: IME
Assunto: FÍSICA
A citação é gerada automaticamente e pode não estar totalmente de acordo com as normas
ABNT
VENTURA, S. D. et al. Optimization techniques for the estimation of the thickness and the optical parameters of thin films using reflectance data. Journal of Applied Physics, v. 97, n. 4, 2005Tradução . . Disponível em: https://doi.org/10.1063/1.1849431. Acesso em: 09 nov. 2025.
APA
Ventura, S. D., Birgin, E. J. G., Martinez, J. M., & Chambouleyron, I. E. (2005). Optimization techniques for the estimation of the thickness and the optical parameters of thin films using reflectance data. Journal of Applied Physics, 97( 4). doi:10.1063/1.1849431
NLM
Ventura SD, Birgin EJG, Martinez JM, Chambouleyron IE. Optimization techniques for the estimation of the thickness and the optical parameters of thin films using reflectance data [Internet]. Journal of Applied Physics. 2005 ; 97( 4):[citado 2025 nov. 09 ] Available from: https://doi.org/10.1063/1.1849431
Vancouver
Ventura SD, Birgin EJG, Martinez JM, Chambouleyron IE. Optimization techniques for the estimation of the thickness and the optical parameters of thin films using reflectance data [Internet]. Journal of Applied Physics. 2005 ; 97( 4):[citado 2025 nov. 09 ] Available from: https://doi.org/10.1063/1.1849431
Artigo de periodico
Optical constants and thickness determination of very thin amorphous semiconductor films (2002)
Chambouleyron, Ivan Emílio; Ventura, S. D.; Birgin, Ernesto Julian Goldberg ; Martínez, José Mário
Fonte: Journal of Applied Physics. Unidade: IME
Assuntos: ALGORITMOS, SEMICONDUTORES, DIELÉTRICOS
A citação é gerada automaticamente e pode não estar totalmente de acordo com as normas
ABNT
CHAMBOULEYRON, Ivan Emílio et al. Optical constants and thickness determination of very thin amorphous semiconductor films. Journal of Applied Physics, v. 92, n. 6, p. 3093-3102, 2002Tradução . . Disponível em: https://doi.org/10.1063/1.1500785. Acesso em: 09 nov. 2025.
APA
Chambouleyron, I. E., Ventura, S. D., Birgin, E. J. G., & Martínez, J. M. (2002). Optical constants and thickness determination of very thin amorphous semiconductor films. Journal of Applied Physics, 92( 6), 3093-3102. doi:10.1063/1.1500785
NLM
Chambouleyron IE, Ventura SD, Birgin EJG, Martínez JM. Optical constants and thickness determination of very thin amorphous semiconductor films [Internet]. Journal of Applied Physics. 2002 ; 92( 6): 3093-3102.[citado 2025 nov. 09 ] Available from: https://doi.org/10.1063/1.1500785
Vancouver
Chambouleyron IE, Ventura SD, Birgin EJG, Martínez JM. Optical constants and thickness determination of very thin amorphous semiconductor films [Internet]. Journal of Applied Physics. 2002 ; 92( 6): 3093-3102.[citado 2025 nov. 09 ] Available from: https://doi.org/10.1063/1.1500785

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