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Artigo de periodico
Alternating current-generated plasma discharges for the controlled direct current charging of ferroelectrets (2013)
Basso, Heitor Cury; Monteiro, José Roberto Boffino de Almeida ; Mazulquim, Daniel Baladelli; Paula, Geyverson Teixeira de; Gonçalves Neto, Luiz; Gerhard, Reimund
Source: Journal of Applied Physics. Unidade: EESC
Subjects: ELETRODINÂMICA, FERROELETRICIDADE
A citação é gerada automaticamente e pode não estar totalmente de acordo com as normas
ABNT
BASSO, Heitor Cury et al. Alternating current-generated plasma discharges for the controlled direct current charging of ferroelectrets. Journal of Applied Physics, v. 114, p. 104101(1-6), 2013Tradução . . Disponível em: https://doi.org/10.1063/1.4821113. Acesso em: 09 nov. 2025.
APA
Basso, H. C., Monteiro, J. R. B. de A., Mazulquim, D. B., Paula, G. T. de, Gonçalves Neto, L., & Gerhard, R. (2013). Alternating current-generated plasma discharges for the controlled direct current charging of ferroelectrets. Journal of Applied Physics, 114, 104101(1-6). doi:10.1063/1.4821113
NLM
Basso HC, Monteiro JRB de A, Mazulquim DB, Paula GT de, Gonçalves Neto L, Gerhard R. Alternating current-generated plasma discharges for the controlled direct current charging of ferroelectrets [Internet]. Journal of Applied Physics. 2013 ; 114 104101(1-6).[citado 2025 nov. 09 ] Available from: https://doi.org/10.1063/1.4821113
Vancouver
Basso HC, Monteiro JRB de A, Mazulquim DB, Paula GT de, Gonçalves Neto L, Gerhard R. Alternating current-generated plasma discharges for the controlled direct current charging of ferroelectrets [Internet]. Journal of Applied Physics. 2013 ; 114 104101(1-6).[citado 2025 nov. 09 ] Available from: https://doi.org/10.1063/1.4821113
Artigo de periodico
Template-based fluoroethylenepropylene piezoelectrets with tubular channels for transducer applications (2009)
Altafim, Ruy Alberto Pisani; Xunlin, Qiu; Wirges, Werner; Gerhard, Reimund; Altafim, Ruy Alberto Corrêa ; Basso, Heitor Cury; Jenninger, Werner; Wagner, Joachim
Source: Journal of Applied Physics. Unidade: EESC
Subjects: FERROELETRICIDADE, PIEZOELETRICIDADE, POLÍMEROS (MATERIAIS)
A citação é gerada automaticamente e pode não estar totalmente de acordo com as normas
ABNT
ALTAFIM, Ruy Alberto Pisani et al. Template-based fluoroethylenepropylene piezoelectrets with tubular channels for transducer applications. Journal of Applied Physics, v. 106, n. 1, p. 014106/1-014106/5, 2009Tradução . . Disponível em: https://doi.org/10.1063/1.3159039. Acesso em: 09 nov. 2025.
APA
Altafim, R. A. P., Xunlin, Q., Wirges, W., Gerhard, R., Altafim, R. A. C., Basso, H. C., et al. (2009). Template-based fluoroethylenepropylene piezoelectrets with tubular channels for transducer applications. Journal of Applied Physics, 106( 1), 014106/1-014106/5. doi:10.1063/1.3159039
NLM
Altafim RAP, Xunlin Q, Wirges W, Gerhard R, Altafim RAC, Basso HC, Jenninger W, Wagner J. Template-based fluoroethylenepropylene piezoelectrets with tubular channels for transducer applications [Internet]. Journal of Applied Physics. 2009 ; 106( 1): 014106/1-014106/5.[citado 2025 nov. 09 ] Available from: https://doi.org/10.1063/1.3159039
Vancouver
Altafim RAP, Xunlin Q, Wirges W, Gerhard R, Altafim RAC, Basso HC, Jenninger W, Wagner J. Template-based fluoroethylenepropylene piezoelectrets with tubular channels for transducer applications [Internet]. Journal of Applied Physics. 2009 ; 106( 1): 014106/1-014106/5.[citado 2025 nov. 09 ] Available from: https://doi.org/10.1063/1.3159039
Artigo de periodico
Partially oxidized amorphous silicon as tunneling barrier for josephson devices (1986)
Celaschi, S
Source: Journal of Applied Physics. Unidade: EESC
Assunto: ENGENHARIA ELÉTRICA
A citação é gerada automaticamente e pode não estar totalmente de acordo com as normas
ABNT
CELASCHI, S. Partially oxidized amorphous silicon as tunneling barrier for josephson devices. Journal of Applied Physics, v. 60, p. 296-303, 1986Tradução . . Disponível em: https://doi.org/10.1063/1.337644. Acesso em: 09 nov. 2025.
APA
Celaschi, S. (1986). Partially oxidized amorphous silicon as tunneling barrier for josephson devices. Journal of Applied Physics, 60, 296-303. doi:10.1063/1.337644
NLM
Celaschi S. Partially oxidized amorphous silicon as tunneling barrier for josephson devices [Internet]. Journal of Applied Physics. 1986 ; 60 296-303.[citado 2025 nov. 09 ] Available from: https://doi.org/10.1063/1.337644
Vancouver
Celaschi S. Partially oxidized amorphous silicon as tunneling barrier for josephson devices [Internet]. Journal of Applied Physics. 1986 ; 60 296-303.[citado 2025 nov. 09 ] Available from: https://doi.org/10.1063/1.337644

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