Analysis of the mean crystallite size and microstress in titanium silicide thin films (1989)
Morimoto, Nilton Itiro 
; Swart, Jacobus Willibrordus; Riella, Humberto Gracher
Source: Applied Surface Science. Unidade: EP
Assunto: FILMES FINOS
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ABNT
MORIMOTO, Nilton Itiro e SWART, Jacobus Willibrordus e RIELLA, Humberto Gracher. Analysis of the mean crystallite size and microstress in titanium silicide thin films. Applied Surface Science, v. 38, n. 1-4, p. se 1989, 1989Tradução . . Disponível em: https://doi.org/10.1016/0169-4332(89)90517-5. Acesso em: 16 nov. 2025.APA
Morimoto, N. I., Swart, J. W., & Riella, H. G. (1989). Analysis of the mean crystallite size and microstress in titanium silicide thin films. Applied Surface Science, 38( 1-4), se 1989. doi:10.1016/0169-4332(89)90517-5NLM
Morimoto NI, Swart JW, Riella HG. Analysis of the mean crystallite size and microstress in titanium silicide thin films [Internet]. Applied Surface Science. 1989 ;38( 1-4): se 1989.[citado 2025 nov. 16 ] Available from: https://doi.org/10.1016/0169-4332(89)90517-5Vancouver
Morimoto NI, Swart JW, Riella HG. Analysis of the mean crystallite size and microstress in titanium silicide thin films [Internet]. Applied Surface Science. 1989 ;38( 1-4): se 1989.[citado 2025 nov. 16 ] Available from: https://doi.org/10.1016/0169-4332(89)90517-5
