Electronic properties of multiple 'DELTA-DOPED' layers in silicon and 'GA' 'AS' (1994)
Fonte: International Journal of Quantum Chemistry. Unidade: IF
Assunto: MATÉRIA CONDENSADA
ABNT
SCOLFARO, L M R et al. Electronic properties of multiple 'DELTA-DOPED' layers in silicon and 'GA' 'AS'. International Journal of Quantum Chemistry, v. s28, p. 667-73, 1994Tradução . . Acesso em: 08 nov. 2024.APA
Scolfaro, L. M. R., Lino, A. T., Takahashi, E., & Leite, J. R. (1994). Electronic properties of multiple 'DELTA-DOPED' layers in silicon and 'GA' 'AS'. International Journal of Quantum Chemistry, s28, 667-73.NLM
Scolfaro LMR, Lino AT, Takahashi E, Leite JR. Electronic properties of multiple 'DELTA-DOPED' layers in silicon and 'GA' 'AS'. International Journal of Quantum Chemistry. 1994 ;s28 667-73.[citado 2024 nov. 08 ]Vancouver
Scolfaro LMR, Lino AT, Takahashi E, Leite JR. Electronic properties of multiple 'DELTA-DOPED' layers in silicon and 'GA' 'AS'. International Journal of Quantum Chemistry. 1994 ;s28 667-73.[citado 2024 nov. 08 ]