Contamination due to memory effects in filtered vacuum arc plasma deposition systems (2002)
Source: Applied Physics Letters. Unidades: IF, EP
Subjects: VÁCUO, FÍSICA DE PLASMAS, FILMES FINOS
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ABNT
MARTINS, Deilton Reis et al. Contamination due to memory effects in filtered vacuum arc plasma deposition systems. Applied Physics Letters, v. 81, n. 11, p. 1969-1971, 2002Tradução . . Disponível em: https://doi.org/10.1063/1.1506019. Acesso em: 04 nov. 2025.APA
Martins, D. R., Salvadori, M. C. B. da S., Verdonck, P. B., & Brown, I. G. (2002). Contamination due to memory effects in filtered vacuum arc plasma deposition systems. Applied Physics Letters, 81( 11), 1969-1971. doi:10.1063/1.1506019NLM
Martins DR, Salvadori MCB da S, Verdonck PB, Brown IG. Contamination due to memory effects in filtered vacuum arc plasma deposition systems [Internet]. Applied Physics Letters. 2002 ; 81( 11): 1969-1971.[citado 2025 nov. 04 ] Available from: https://doi.org/10.1063/1.1506019Vancouver
Martins DR, Salvadori MCB da S, Verdonck PB, Brown IG. Contamination due to memory effects in filtered vacuum arc plasma deposition systems [Internet]. Applied Physics Letters. 2002 ; 81( 11): 1969-1971.[citado 2025 nov. 04 ] Available from: https://doi.org/10.1063/1.1506019
