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Filtros : "EP-EP" "Applied Surface Science" Removido: "Chemical Engineering Research and Design" Limpar

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  • Artigo de periodico

    Surface interaction of CO2/H2 mixture on mesoporous ZrO2: effect of crystalline polymorph phases (2019)

    Marcos, Francielle Candian Firmino ; Assaf, Jose Mansur ; Giudici, Reinaldo ; Assaf, Elisabete Moreira

    Source: Applied Surface Science. Unidades: IQSC, EP

    Assunto: SURFACTANTES

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    • ABNT

      MARCOS, Francielle Candian Firmino et al. Surface interaction of CO2/H2 mixture on mesoporous ZrO2: effect of crystalline polymorph phases. Applied Surface Science, v. 484, p. 1128-1140, 2019Tradução . . Disponível em: https://doi.org/10.1016/j.apsusc.2019.143671. Acesso em: 03 jul. 2025.

    • APA

      Marcos, F. C. F., Assaf, J. M., Giudici, R., & Assaf, E. M. (2019). Surface interaction of CO2/H2 mixture on mesoporous ZrO2: effect of crystalline polymorph phases. Applied Surface Science, 484, 1128-1140. doi:10.1016/j.apsusc.2019.143671

    • NLM

      Marcos FCF, Assaf JM, Giudici R, Assaf EM. Surface interaction of CO2/H2 mixture on mesoporous ZrO2: effect of crystalline polymorph phases [Internet]. Applied Surface Science. 2019 ; 484 1128-1140.[citado 2025 jul. 03 ] Available from: https://doi.org/10.1016/j.apsusc.2019.143671

    • Vancouver

      Marcos FCF, Assaf JM, Giudici R, Assaf EM. Surface interaction of CO2/H2 mixture on mesoporous ZrO2: effect of crystalline polymorph phases [Internet]. Applied Surface Science. 2019 ; 484 1128-1140.[citado 2025 jul. 03 ] Available from: https://doi.org/10.1016/j.apsusc.2019.143671

  • Artigo de periodico

    Deep trench etching in silicon with fluorine containing plasmas (1996)

    Mansano, Ronaldo Domingues ; Verdonck, Patrick Bernard; Maciel, H. S.

    Source: Applied Surface Science. Unidade: EP

    Assunto: CIRCUITOS INTEGRADOS

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    • ABNT

      MANSANO, Ronaldo Domingues e VERDONCK, Patrick Bernard e MACIEL, H. S. Deep trench etching in silicon with fluorine containing plasmas. Applied Surface Science, v. 100/101, p. 583-586, 1996Tradução . . Disponível em: https://doi.org/10.1016/0169-4332(96)00343-1. Acesso em: 03 jul. 2025.

    • APA

      Mansano, R. D., Verdonck, P. B., & Maciel, H. S. (1996). Deep trench etching in silicon with fluorine containing plasmas. Applied Surface Science, 100/101, 583-586. doi:10.1016/0169-4332(96)00343-1

    • NLM

      Mansano RD, Verdonck PB, Maciel HS. Deep trench etching in silicon with fluorine containing plasmas [Internet]. Applied Surface Science. 1996 ; 100/101 583-586.[citado 2025 jul. 03 ] Available from: https://doi.org/10.1016/0169-4332(96)00343-1

    • Vancouver

      Mansano RD, Verdonck PB, Maciel HS. Deep trench etching in silicon with fluorine containing plasmas [Internet]. Applied Surface Science. 1996 ; 100/101 583-586.[citado 2025 jul. 03 ] Available from: https://doi.org/10.1016/0169-4332(96)00343-1
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