Subjects: ALUMÍNIO, ESPECTROMETRIA
ABNT
SANTOS, Demetrio Jackson dos et al. Properties of aluminum oxide thin film obtained by metal plasma immersion ion implantation and deposition after zirconium-based pretreatment. VACUUM, v. no 2015, p. 32-41, 2015Tradução . . Disponível em: https://doi.org/10.1016/j.vacuum.2015.07.016. Acesso em: 10 out. 2024.APA
Santos, D. J. dos, Tavares, L. B., Antunes, R. A., Droppa Jr., R., Silva, T. F. da, & Salvadori, M. C. B. da S. (2015). Properties of aluminum oxide thin film obtained by metal plasma immersion ion implantation and deposition after zirconium-based pretreatment. VACUUM, no 2015, 32-41. doi:10.1016/j.vacuum.2015.07.016NLM
Santos DJ dos, Tavares LB, Antunes RA, Droppa Jr. R, Silva TF da, Salvadori MCB da S. Properties of aluminum oxide thin film obtained by metal plasma immersion ion implantation and deposition after zirconium-based pretreatment [Internet]. VACUUM. 2015 ; no 2015 32-41.[citado 2024 out. 10 ] Available from: https://doi.org/10.1016/j.vacuum.2015.07.016Vancouver
Santos DJ dos, Tavares LB, Antunes RA, Droppa Jr. R, Silva TF da, Salvadori MCB da S. Properties of aluminum oxide thin film obtained by metal plasma immersion ion implantation and deposition after zirconium-based pretreatment [Internet]. VACUUM. 2015 ; no 2015 32-41.[citado 2024 out. 10 ] Available from: https://doi.org/10.1016/j.vacuum.2015.07.016