Source: Surface & Coatings Technology. Conference titles: International Workshop on Plasma-Based Ion Implantation and Deposition. Unidades: IF, EP
Assunto: ESPECTROSCOPIA DE RAIO X
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MATSUOKA, Masao et al. Chemical bonding and composition of silicon nitride films prepared by inductively coupled plasma chemical vapor deposition. Surface & Coatings Technology. Amsterdam: Elsevier Science. Disponível em: http://www.sciencedirect.com/science/journal/02578972. Acesso em: 04 ago. 2024. , 2010APA
Matsuoka, M., Isotani, S., Mamani, W. A. S., Zambom, L. da S., & Ogata, K. (2010). Chemical bonding and composition of silicon nitride films prepared by inductively coupled plasma chemical vapor deposition. Surface & Coatings Technology. Amsterdam: Elsevier Science. Recuperado de http://www.sciencedirect.com/science/journal/02578972NLM
Matsuoka M, Isotani S, Mamani WAS, Zambom L da S, Ogata K. Chemical bonding and composition of silicon nitride films prepared by inductively coupled plasma chemical vapor deposition [Internet]. Surface & Coatings Technology. 2010 ; 204 18-19.[citado 2024 ago. 04 ] Available from: http://www.sciencedirect.com/science/journal/02578972Vancouver
Matsuoka M, Isotani S, Mamani WAS, Zambom L da S, Ogata K. Chemical bonding and composition of silicon nitride films prepared by inductively coupled plasma chemical vapor deposition [Internet]. Surface & Coatings Technology. 2010 ; 204 18-19.[citado 2024 ago. 04 ] Available from: http://www.sciencedirect.com/science/journal/02578972