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Artigo de periodico
Description and characterization of a ECR plasma device developed for thin film deposition (2003)
Matta, J A S da; Galvao, Ricardo Magnus Osorio; Ruchko, L; Fantini, Márcia Carvalho de Abreu ; Kiyohara, Pedro Kunihiko
Source: Brazilian Journal of Physics. Unidade: IF
Assunto: FILMES FINOS
A citação é gerada automaticamente e pode não estar totalmente de acordo com as normas
ABNT
MATTA, J A S da et al. Description and characterization of a ECR plasma device developed for thin film deposition. Brazilian Journal of Physics, v. 33, n. 1, p. 123-127, 2003Tradução . . Disponível em: https://doi.org/10.1590/s0103-97332003000100011. Acesso em: 18 ago. 2024.
APA
Matta, J. A. S. da, Galvao, R. M. O., Ruchko, L., Fantini, M. C. de A., & Kiyohara, P. K. (2003). Description and characterization of a ECR plasma device developed for thin film deposition. Brazilian Journal of Physics, 33( 1), 123-127. doi:10.1590/s0103-97332003000100011
NLM
Matta JAS da, Galvao RMO, Ruchko L, Fantini MC de A, Kiyohara PK. Description and characterization of a ECR plasma device developed for thin film deposition [Internet]. Brazilian Journal of Physics. 2003 ; 33( 1): 123-127.[citado 2024 ago. 18 ] Available from: https://doi.org/10.1590/s0103-97332003000100011
Vancouver
Matta JAS da, Galvao RMO, Ruchko L, Fantini MC de A, Kiyohara PK. Description and characterization of a ECR plasma device developed for thin film deposition [Internet]. Brazilian Journal of Physics. 2003 ; 33( 1): 123-127.[citado 2024 ago. 18 ] Available from: https://doi.org/10.1590/s0103-97332003000100011
Artigo de periodico
Description and characterization of a ECR plasma device developed for thin film deposition (2003)
Matta, J A S da; Galvao, Ricardo Magnus Osorio; Ruchko, L; Fantini, Márcia Carvalho de Abreu ; Kiyohara, Pedro Kunihiko
Source: Brazilian Journal of Physics. Unidade: IF
Subjects: RESSONÂNCIA MAGNÉTICA NUCLEAR, ACELERAÇÃO DE PARTÍCULAS, FÍSICA DE PLASMAS, FILMES FINOS
A citação é gerada automaticamente e pode não estar totalmente de acordo com as normas
ABNT
MATTA, J A S da et al. Description and characterization of a ECR plasma device developed for thin film deposition. Brazilian Journal of Physics, v. 33, n. 1, p. 123-127, 2003Tradução . . Disponível em: https://doi.org/10.1590/s0103-97332003000100011. Acesso em: 18 ago. 2024.
APA
Matta, J. A. S. da, Galvao, R. M. O., Ruchko, L., Fantini, M. C. de A., & Kiyohara, P. K. (2003). Description and characterization of a ECR plasma device developed for thin film deposition. Brazilian Journal of Physics, 33( 1), 123-127. doi:10.1590/s0103-97332003000100011
NLM
Matta JAS da, Galvao RMO, Ruchko L, Fantini MC de A, Kiyohara PK. Description and characterization of a ECR plasma device developed for thin film deposition [Internet]. Brazilian Journal of Physics. 2003 ; 33( 1): 123-127.[citado 2024 ago. 18 ] Available from: https://doi.org/10.1590/s0103-97332003000100011
Vancouver
Matta JAS da, Galvao RMO, Ruchko L, Fantini MC de A, Kiyohara PK. Description and characterization of a ECR plasma device developed for thin film deposition [Internet]. Brazilian Journal of Physics. 2003 ; 33( 1): 123-127.[citado 2024 ago. 18 ] Available from: https://doi.org/10.1590/s0103-97332003000100011
Artigo de periodico
Plasma cleaning and analysis of archeological artefacts from Spain (2003)
Saettone, E A O; Matta, J A S da; Alva, W; Chubaci, Jose Fernando Diniz; Fantini, Márcia Carvalho de Abreu ; Galvao, Ricardo Magnus Osorio; Kiyohara, Pedro Kunihiko; Tabacniks, Manfredo Harri
Source: Journal of Physics D-Applied Physics. Unidade: IF
Subjects: DIFRAÇÃO POR RAIOS X, MICROSCOPIA ELETRÔNICA, ESPECTROSCOPIA DE MASSA
A citação é gerada automaticamente e pode não estar totalmente de acordo com as normas
ABNT
SAETTONE, E A O et al. Plasma cleaning and analysis of archeological artefacts from Spain. Journal of Physics D-Applied Physics, v. 36, n. 7, p. 842-848, 2003Tradução . . Disponível em: https://doi.org/10.1088/0022-3727/36/7/313. Acesso em: 18 ago. 2024.
APA
Saettone, E. A. O., Matta, J. A. S. da, Alva, W., Chubaci, J. F. D., Fantini, M. C. de A., Galvao, R. M. O., et al. (2003). Plasma cleaning and analysis of archeological artefacts from Spain. Journal of Physics D-Applied Physics, 36( 7), 842-848. doi:10.1088/0022-3727/36/7/313
NLM
Saettone EAO, Matta JAS da, Alva W, Chubaci JFD, Fantini MC de A, Galvao RMO, Kiyohara PK, Tabacniks MH. Plasma cleaning and analysis of archeological artefacts from Spain [Internet]. Journal of Physics D-Applied Physics. 2003 ; 36( 7): 842-848.[citado 2024 ago. 18 ] Available from: https://doi.org/10.1088/0022-3727/36/7/313
Vancouver
Saettone EAO, Matta JAS da, Alva W, Chubaci JFD, Fantini MC de A, Galvao RMO, Kiyohara PK, Tabacniks MH. Plasma cleaning and analysis of archeological artefacts from Spain [Internet]. Journal of Physics D-Applied Physics. 2003 ; 36( 7): 842-848.[citado 2024 ago. 18 ] Available from: https://doi.org/10.1088/0022-3727/36/7/313

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