The effect of electrode materials on etching mechanisms (2001)
Ruas, Ronaldo; Verdonck, Patrick Bernard; Mansano, Ronaldo Domingues 
; Braithwaite, Nicholas
Source: Proceedings. Conference titles: International Symposium on Plasma Chemistry. Unidade: EP
Assunto: MICROELETRÔNICA
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RUAS, Ronaldo et al. The effect of electrode materials on etching mechanisms. 2001, Anais.. Orleans: ISPC, 2001. . Acesso em: 09 out. 2024.APA
Ruas, R., Verdonck, P. B., Mansano, R. D., & Braithwaite, N. (2001). The effect of electrode materials on etching mechanisms. In Proceedings. Orleans: ISPC.NLM
Ruas R, Verdonck PB, Mansano RD, Braithwaite N. The effect of electrode materials on etching mechanisms. Proceedings. 2001 ;[citado 2024 out. 09 ]Vancouver
Ruas R, Verdonck PB, Mansano RD, Braithwaite N. The effect of electrode materials on etching mechanisms. Proceedings. 2001 ;[citado 2024 out. 09 ]
