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Filtros : "MICROELETRÔNICA" "Abstracts" Removidos: "Indexado no: Web of Science" "ARAUJO, GUSTAVO VINICIUS DE" Limpar

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  • Trabalho de evento-resumo

    High aspect ratio silicon microchannel definition via ICP plasma etching using SF6/Ar as gas mixture (2021)

    Alvarez, H. S.; Cioldim, F. H.; Silva, A. R.; Diniz, J. A.

    Source: Abstracts. Conference titles: Workshop on Semiconductors and Micro and Nano Technology - SEMINATEC. Unidade: EESC

    Subjects: TRANSFERÊNCIA DE CALOR, CIRCUITOS INTEGRADOS, MICROELETRÔNICA, ENGENHARIA MECÂNICA

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    • ABNT

      ALVAREZ, H. S. et al. High aspect ratio silicon microchannel definition via ICP plasma etching using SF6/Ar as gas mixture. 2021, Anais.. São Paulo, SP: SBMicro, 2021. Disponível em: https://repositorio.usp.br/directbitstream/af37cdf0-62e5-4e55-90a1-799f83a30bb5/PROD_26257_SYSNO_3153042.pdf. Acesso em: 10 out. 2024.

    • APA

      Alvarez, H. S., Cioldim, F. H., Silva, A. R., & Diniz, J. A. (2021). High aspect ratio silicon microchannel definition via ICP plasma etching using SF6/Ar as gas mixture. In Abstracts. São Paulo, SP: SBMicro. Recuperado de https://repositorio.usp.br/directbitstream/af37cdf0-62e5-4e55-90a1-799f83a30bb5/PROD_26257_SYSNO_3153042.pdf

    • NLM

      Alvarez HS, Cioldim FH, Silva AR, Diniz JA. High aspect ratio silicon microchannel definition via ICP plasma etching using SF6/Ar as gas mixture [Internet]. Abstracts. 2021 ;[citado 2024 out. 10 ] Available from: https://repositorio.usp.br/directbitstream/af37cdf0-62e5-4e55-90a1-799f83a30bb5/PROD_26257_SYSNO_3153042.pdf

    • Vancouver

      Alvarez HS, Cioldim FH, Silva AR, Diniz JA. High aspect ratio silicon microchannel definition via ICP plasma etching using SF6/Ar as gas mixture [Internet]. Abstracts. 2021 ;[citado 2024 out. 10 ] Available from: https://repositorio.usp.br/directbitstream/af37cdf0-62e5-4e55-90a1-799f83a30bb5/PROD_26257_SYSNO_3153042.pdf

  • Trabalho de evento-resumo

    Poly (N-vinylcarbazole) conductor trails for microelectronics devices (2006)

    Moreira, Taís Aparecida de Assis Garcia; Possidonio, Shirley; Wang, Shu Hui ; Onmori, Roberto Koji

    Source: Abstracts. Conference titles: Brazilian MRS Meeting. Unidade: EP

    Subjects: MATERIAIS, MICROELETRÔNICA

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    • ABNT

      MOREIRA, Taís Aparecida de Assis Garcia et al. Poly (N-vinylcarbazole) conductor trails for microelectronics devices. 2006, Anais.. Florianópolis: SBPMat - Sociedade Brasileira de Pesquisa em Materiais, 2006. Disponível em: https://repositorio.usp.br/directbitstream/8b5129d6-d755-440d-8ab6-56635805c317/HUI-2006-Poly%28N-_ok.pdf. Acesso em: 10 out. 2024.

    • APA

      Moreira, T. A. de A. G., Possidonio, S., Wang, S. H., & Onmori, R. K. (2006). Poly (N-vinylcarbazole) conductor trails for microelectronics devices. In Abstracts. Florianópolis: SBPMat - Sociedade Brasileira de Pesquisa em Materiais. Recuperado de https://repositorio.usp.br/directbitstream/8b5129d6-d755-440d-8ab6-56635805c317/HUI-2006-Poly%28N-_ok.pdf

    • NLM

      Moreira TA de AG, Possidonio S, Wang SH, Onmori RK. Poly (N-vinylcarbazole) conductor trails for microelectronics devices [Internet]. Abstracts. 2006 ;[citado 2024 out. 10 ] Available from: https://repositorio.usp.br/directbitstream/8b5129d6-d755-440d-8ab6-56635805c317/HUI-2006-Poly%28N-_ok.pdf

    • Vancouver

      Moreira TA de AG, Possidonio S, Wang SH, Onmori RK. Poly (N-vinylcarbazole) conductor trails for microelectronics devices [Internet]. Abstracts. 2006 ;[citado 2024 out. 10 ] Available from: https://repositorio.usp.br/directbitstream/8b5129d6-d755-440d-8ab6-56635805c317/HUI-2006-Poly%28N-_ok.pdf
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