Study of CF4+H2 plasma surface modification of PMMA for plastic waveguides processing (1998)
Source: ICMP 98: proceedings. Conference titles: International Conference on Microelectronics and Packaging. Unidade: EP
Assunto: MICROELETRÔNICA
ABNT
BARTOLI, Julio Roberto et al. Study of CF4+H2 plasma surface modification of PMMA for plastic waveguides processing. 1998, Anais.. São Paulo: Novodisc, 1998. . Acesso em: 09 out. 2024.APA
Bartoli, J. R., Mansano, R. D., Verdonck, P. B., Paez Carreño, M. N., Costa, R. A. da, Castro, S. C. de, et al. (1998). Study of CF4+H2 plasma surface modification of PMMA for plastic waveguides processing. In ICMP 98: proceedings. São Paulo: Novodisc.NLM
Bartoli JR, Mansano RD, Verdonck PB, Paez Carreño MN, Costa RA da, Castro SC de, Martins OLB, Leone Filho R. Study of CF4+H2 plasma surface modification of PMMA for plastic waveguides processing. ICMP 98: proceedings. 1998 ;[citado 2024 out. 09 ]Vancouver
Bartoli JR, Mansano RD, Verdonck PB, Paez Carreño MN, Costa RA da, Castro SC de, Martins OLB, Leone Filho R. Study of CF4+H2 plasma surface modification of PMMA for plastic waveguides processing. ICMP 98: proceedings. 1998 ;[citado 2024 out. 09 ]