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Filtros : "MICROELETRÔNICA" "Langer, Robert" Removido: "2022" Limpar

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  • Artigo de periodico

    Low-Frequency Noise Assessment of Different Ge pFinFET STI Processes (2016)

    Oliveira, Alberto Vinicius de; Simoen, Eddy ; Mitard Jerome; Agopian, Paula Ghedini Der ; Langer, Robert; Witters, Liesbeth J; Martino, João Antonio

    Source: IEEE Transactions on Electron Devices. Unidade: EP

    Subjects: MICROELETRÔNICA, SILÍCIO

    Acesso à fonteDOIHow to cite
    A citação é gerada automaticamente e pode não estar totalmente de acordo com as normas

    • ABNT

      OLIVEIRA, Alberto Vinicius de et al. Low-Frequency Noise Assessment of Different Ge pFinFET STI Processes. IEEE Transactions on Electron Devices, v. 63, n. 10, p. 4031-4037, 2016Tradução . . Disponível em: https://doi.org/10.1109/ted.2016.2598288. Acesso em: 09 out. 2024.

    • APA

      Oliveira, A. V. de, Simoen, E., Mitard Jerome,, Agopian, P. G. D., Langer, R., Witters, L. J., & Martino, J. A. (2016). Low-Frequency Noise Assessment of Different Ge pFinFET STI Processes. IEEE Transactions on Electron Devices, 63( 10), 4031-4037. doi:10.1109/ted.2016.2598288

    • NLM

      Oliveira AV de, Simoen E, Mitard Jerome, Agopian PGD, Langer R, Witters LJ, Martino JA. Low-Frequency Noise Assessment of Different Ge pFinFET STI Processes [Internet]. IEEE Transactions on Electron Devices. 2016 ; 63( 10): 4031-4037.[citado 2024 out. 09 ] Available from: https://doi.org/10.1109/ted.2016.2598288

    • Vancouver

      Oliveira AV de, Simoen E, Mitard Jerome, Agopian PGD, Langer R, Witters LJ, Martino JA. Low-Frequency Noise Assessment of Different Ge pFinFET STI Processes [Internet]. IEEE Transactions on Electron Devices. 2016 ; 63( 10): 4031-4037.[citado 2024 out. 09 ] Available from: https://doi.org/10.1109/ted.2016.2598288

  • Artigo de periodico

    Split CV mobility at low temperature operation of Ge pFinFETs fabricated with STI first and last processes (2016)

    Oliveira, Alberto Vinicius de; Agopian, Paula Ghedini Der ; Simoen, Eddy ; Langer, Robert; Collaert, Nadine ; Thean, Aaron; Claeys, Cor ; Martino, João Antonio

    Source: Semiconductor Science and Technology. Unidade: EP

    Subjects: SEMICONDUTORES, MICROELETRÔNICA

    Acesso à fonteDOIHow to cite
    A citação é gerada automaticamente e pode não estar totalmente de acordo com as normas

    • ABNT

      OLIVEIRA, Alberto Vinicius de et al. Split CV mobility at low temperature operation of Ge pFinFETs fabricated with STI first and last processes. Semiconductor Science and Technology, v. 31, n. 11, p. 114002 , 2016Tradução . . Disponível em: https://doi.org/10.1088/0268-1242/31/11/114002. Acesso em: 09 out. 2024.

    • APA

      Oliveira, A. V. de, Agopian, P. G. D., Simoen, E., Langer, R., Collaert, N., Thean, A., et al. (2016). Split CV mobility at low temperature operation of Ge pFinFETs fabricated with STI first and last processes. Semiconductor Science and Technology, 31( 11), 114002 . doi:10.1088/0268-1242/31/11/114002

    • NLM

      Oliveira AV de, Agopian PGD, Simoen E, Langer R, Collaert N, Thean A, Claeys C, Martino JA. Split CV mobility at low temperature operation of Ge pFinFETs fabricated with STI first and last processes [Internet]. Semiconductor Science and Technology. 2016 ; 31( 11): 114002 .[citado 2024 out. 09 ] Available from: https://doi.org/10.1088/0268-1242/31/11/114002

    • Vancouver

      Oliveira AV de, Agopian PGD, Simoen E, Langer R, Collaert N, Thean A, Claeys C, Martino JA. Split CV mobility at low temperature operation of Ge pFinFETs fabricated with STI first and last processes [Internet]. Semiconductor Science and Technology. 2016 ; 31( 11): 114002 .[citado 2024 out. 09 ] Available from: https://doi.org/10.1088/0268-1242/31/11/114002
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