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Filtros : "MICROELETRÔNICA" "Gonçalves, Lucas Gonçalves Dias" Removidos: "Indexado no: Web of Science" "ARAUJO, GUSTAVO VINICIUS DE" Limpar

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Trabalho de evento
Study of nickel silicide as mask for alkaline solutions to V-grooves fabrication (2007)
Mascaro, Amanda Rossi; Gonçalves, Lucas Gonçalves Dias; Morimoto, Nilton Itiro
Source: SBMicro 2007. Conference titles: International Symposium on Microelectronics Technology and Devices SBMICRO. Unidade: EP
Assunto: MICROELETRÔNICA
A citação é gerada automaticamente e pode não estar totalmente de acordo com as normas
ABNT
MASCARO, Amanda Rossi e GONÇALVES, Lucas Gonçalves Dias e MORIMOTO, Nilton Itiro. Study of nickel silicide as mask for alkaline solutions to V-grooves fabrication. 2007, Anais.. Pennington: The Electrochemical Society, 2007. . Acesso em: 13 nov. 2024.
APA
Mascaro, A. R., Gonçalves, L. G. D., & Morimoto, N. I. (2007). Study of nickel silicide as mask for alkaline solutions to V-grooves fabrication. In SBMicro 2007. Pennington: The Electrochemical Society.
NLM
Mascaro AR, Gonçalves LGD, Morimoto NI. Study of nickel silicide as mask for alkaline solutions to V-grooves fabrication. SBMicro 2007. 2007 ;[citado 2024 nov. 13 ]
Vancouver
Mascaro AR, Gonçalves LGD, Morimoto NI. Study of nickel silicide as mask for alkaline solutions to V-grooves fabrication. SBMicro 2007. 2007 ;[citado 2024 nov. 13 ]
Parte de monografia/livro
Mechanical properties of silicon oxide films deposited by PECVD-TEOS for application in MEMS structures and sensors (2002)
Gonçalves, Lucas Gonçalves Dias; Silva, Antônio Nélson Rodrigues da; Alfano, C.F.; Santos, J. C.; Morimoto, Nilton Itiro
Source: Microelectronics Technology and Devices SBMICRO 2002. Conference titles: International Symposium on Microelectronics Technology and Devices SBMICRO 2002, Porto Alegre, 2002. Unidade: EP
Assunto: MICROELETRÔNICA
A citação é gerada automaticamente e pode não estar totalmente de acordo com as normas
ABNT
GONÇALVES, Lucas Gonçalves Dias et al. Mechanical properties of silicon oxide films deposited by PECVD-TEOS for application in MEMS structures and sensors. Microelectronics Technology and Devices SBMICRO 2002. Tradução . Pennington: The Electrochemical Society, 2002. . . Acesso em: 13 nov. 2024.
APA
Gonçalves, L. G. D., Silva, A. N. R. da, Alfano, C. F., Santos, J. C., & Morimoto, N. I. (2002). Mechanical properties of silicon oxide films deposited by PECVD-TEOS for application in MEMS structures and sensors. In Microelectronics Technology and Devices SBMICRO 2002. Pennington: The Electrochemical Society.
NLM
Gonçalves LGD, Silva ANR da, Alfano CF, Santos JC, Morimoto NI. Mechanical properties of silicon oxide films deposited by PECVD-TEOS for application in MEMS structures and sensors. In: Microelectronics Technology and Devices SBMICRO 2002. Pennington: The Electrochemical Society; 2002. [citado 2024 nov. 13 ]
Vancouver
Gonçalves LGD, Silva ANR da, Alfano CF, Santos JC, Morimoto NI. Mechanical properties of silicon oxide films deposited by PECVD-TEOS for application in MEMS structures and sensors. In: Microelectronics Technology and Devices SBMICRO 2002. Pennington: The Electrochemical Society; 2002. [citado 2024 nov. 13 ]

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