Innovative low temperature plasma approach for deposition of alumina films (2014)
Source: Materials Research. Unidade: IF
Subjects: FÍSICA NUCLEAR, MATERIAIS, FÍSICA DE PLASMAS, ALUMÍNIO
ABNT
BATTAGLIN, Felipe Augusto Darriba et al. Innovative low temperature plasma approach for deposition of alumina films. Materials Research, v. 17, n. 6, p. 1410-1419, 2014Tradução . . Disponível em: https://doi.org/10.1590/1516-1439.283514. Acesso em: 07 jul. 2024.APA
Battaglin, F. A. D., Hosokawa, R. S., Cruz, N. C. da, Caseli, L., Rangel, E. C., Silva, T. F. da, & Tabacniks, M. (2014). Innovative low temperature plasma approach for deposition of alumina films. Materials Research, 17( 6), 1410-1419. doi:10.1590/1516-1439.283514NLM
Battaglin FAD, Hosokawa RS, Cruz NC da, Caseli L, Rangel EC, Silva TF da, Tabacniks M. Innovative low temperature plasma approach for deposition of alumina films [Internet]. Materials Research. 2014 ; 17( 6): 1410-1419.[citado 2024 jul. 07 ] Available from: https://doi.org/10.1590/1516-1439.283514Vancouver
Battaglin FAD, Hosokawa RS, Cruz NC da, Caseli L, Rangel EC, Silva TF da, Tabacniks M. Innovative low temperature plasma approach for deposition of alumina films [Internet]. Materials Research. 2014 ; 17( 6): 1410-1419.[citado 2024 jul. 07 ] Available from: https://doi.org/10.1590/1516-1439.283514