Study of CF4+H2 plasma surface modification of PMMA for plastic waveguides processing (1998)
Source: ICMP 98: proceedings. Conference titles: International Conference on Microelectronics and Packaging. Unidade: EP
Assunto: MICROELETRÔNICA
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BARTOLI, Julio Roberto et al. Study of CF4+H2 plasma surface modification of PMMA for plastic waveguides processing. 1998, Anais.. São Paulo: Novodisc, 1998. . Acesso em: 26 ago. 2024.APA
Bartoli, J. R., Mansano, R. D., Verdonck, P. B., Paez Carreño, M. N., Costa, R. A. da, Castro, S. C. de, et al. (1998). Study of CF4+H2 plasma surface modification of PMMA for plastic waveguides processing. In ICMP 98: proceedings. São Paulo: Novodisc.NLM
Bartoli JR, Mansano RD, Verdonck PB, Paez Carreño MN, Costa RA da, Castro SC de, Martins OLB, Leone Filho R. Study of CF4+H2 plasma surface modification of PMMA for plastic waveguides processing. ICMP 98: proceedings. 1998 ;[citado 2024 ago. 26 ]Vancouver
Bartoli JR, Mansano RD, Verdonck PB, Paez Carreño MN, Costa RA da, Castro SC de, Martins OLB, Leone Filho R. Study of CF4+H2 plasma surface modification of PMMA for plastic waveguides processing. ICMP 98: proceedings. 1998 ;[citado 2024 ago. 26 ]