Source: Surface & Coatings Technology. Unidades: EP, IF
Subjects: NANOTECNOLOGIA, FILMES FINOS
ABNT
MOUSINHO, Ana Paulo e MANSANO, Ronaldo Domingues e SALVADORI, Maria Cecília Barbosa da Silveira. Influence of substrate surface topography in the deposition of nanostructured diamond-like carbon films by high density plasma chemical vapor deposition. Surface & Coatings Technology, v. 203, n. 9, p. 1193-1198, 2009Tradução . . Disponível em: https://doi.org/10.1016/j.surfcoat.2008.10.025. Acesso em: 26 ago. 2024.APA
Mousinho, A. P., Mansano, R. D., & Salvadori, M. C. B. da S. (2009). Influence of substrate surface topography in the deposition of nanostructured diamond-like carbon films by high density plasma chemical vapor deposition. Surface & Coatings Technology, 203( 9), 1193-1198. doi:10.1016/j.surfcoat.2008.10.025NLM
Mousinho AP, Mansano RD, Salvadori MCB da S. Influence of substrate surface topography in the deposition of nanostructured diamond-like carbon films by high density plasma chemical vapor deposition [Internet]. Surface & Coatings Technology. 2009 ; 203( 9): 1193-1198.[citado 2024 ago. 26 ] Available from: https://doi.org/10.1016/j.surfcoat.2008.10.025Vancouver
Mousinho AP, Mansano RD, Salvadori MCB da S. Influence of substrate surface topography in the deposition of nanostructured diamond-like carbon films by high density plasma chemical vapor deposition [Internet]. Surface & Coatings Technology. 2009 ; 203( 9): 1193-1198.[citado 2024 ago. 26 ] Available from: https://doi.org/10.1016/j.surfcoat.2008.10.025