Production of hidrogenated amorphous silicon films frow a low frequency glow discharge (1992)
Fragalli, J. F.; Misoguti, Lino 
; Nakagaito, A. N.; Branz, H.; Grivickas, V.; Bagnato, Vanderlei Salvador
Source: Proccedings. Conference titles: Workshop on Crystalline and Amorphous Silicon and its Alloys. Unidade: IFQSC
Subjects: CIRCUITOS ELETRÔNICOS, MATÉRIA CONDENSADA
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ABNT
FRAGALLI, J. F. et al. Production of hidrogenated amorphous silicon films frow a low frequency glow discharge. 1992, Anais.. Campinas: UNICAMP, 1992. . Acesso em: 27 out. 2025.APA
Fragalli, J. F., Misoguti, L., Nakagaito, A. N., Branz, H., Grivickas, V., & Bagnato, V. S. (1992). Production of hidrogenated amorphous silicon films frow a low frequency glow discharge. In Proccedings. Campinas: UNICAMP.NLM
Fragalli JF, Misoguti L, Nakagaito AN, Branz H, Grivickas V, Bagnato VS. Production of hidrogenated amorphous silicon films frow a low frequency glow discharge. Proccedings. 1992 ;[citado 2025 out. 27 ]Vancouver
Fragalli JF, Misoguti L, Nakagaito AN, Branz H, Grivickas V, Bagnato VS. Production of hidrogenated amorphous silicon films frow a low frequency glow discharge. Proccedings. 1992 ;[citado 2025 out. 27 ]
