Gonçalves Neto, Luiz; Cirino, Giuseppe Antonio; Mansano, Ronaldo Domingues 
; Verdonck, Patrick Bernard; Seabra, Antonio Carlos
Fonte: Proceedings of SPIE. Nome do evento: Micromachining Technology for Micro-Optics and Nano-Optics II. Unidades: EESC, EP
Assuntos: ÓPTICA ELETRÔNICA, MICROELETRÔNICA
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GONÇALVES NETO, Luiz et al. Design of continuous full complex modulation proximity printing masks using a quadratic phase distribution. Proceedings of SPIE. Bellingham, WA: Escola de Engenharia de São Carlos, Universidade de São Paulo. Disponível em: https://repositorio.usp.br/directbitstream/37a16619-40c9-4c77-bb78-7407a2aa30f6/ok1390500.pdf. Acesso em: 11 nov. 2025. , 2004APA
Gonçalves Neto, L., Cirino, G. A., Mansano, R. D., Verdonck, P. B., & Seabra, A. C. (2004). Design of continuous full complex modulation proximity printing masks using a quadratic phase distribution. Proceedings of SPIE. Bellingham, WA: Escola de Engenharia de São Carlos, Universidade de São Paulo. Recuperado de https://repositorio.usp.br/directbitstream/37a16619-40c9-4c77-bb78-7407a2aa30f6/ok1390500.pdfNLM
Gonçalves Neto L, Cirino GA, Mansano RD, Verdonck PB, Seabra AC. Design of continuous full complex modulation proximity printing masks using a quadratic phase distribution [Internet]. Proceedings of SPIE. 2004 ; 5437 71-78.[citado 2025 nov. 11 ] Available from: https://repositorio.usp.br/directbitstream/37a16619-40c9-4c77-bb78-7407a2aa30f6/ok1390500.pdfVancouver
Gonçalves Neto L, Cirino GA, Mansano RD, Verdonck PB, Seabra AC. Design of continuous full complex modulation proximity printing masks using a quadratic phase distribution [Internet]. Proceedings of SPIE. 2004 ; 5437 71-78.[citado 2025 nov. 11 ] Available from: https://repositorio.usp.br/directbitstream/37a16619-40c9-4c77-bb78-7407a2aa30f6/ok1390500.pdf
