The formation of cobalt silicide in two thermal stages (1997)
Source: Proceedings. Conference titles: International VLSI Multilevel Interconnection Conference - VMIC. Unidade: EP
Assunto: REDES DE COMPUTADORES
ABNT
SIMÕES, Eliphas Wagner e FURLAN, Rogério e SANTIAGO-AVILÉS, Jorge Juan. The formation of cobalt silicide in two thermal stages. 1997, Anais.. Tampa: VMIC, 1997. . Acesso em: 02 mar. 2026.APA
Simões, E. W., Furlan, R., & Santiago-Avilés, J. J. (1997). The formation of cobalt silicide in two thermal stages. In Proceedings. Tampa: VMIC.NLM
Simões EW, Furlan R, Santiago-Avilés JJ. The formation of cobalt silicide in two thermal stages. Proceedings. 1997 ;[citado 2026 mar. 02 ]Vancouver
Simões EW, Furlan R, Santiago-Avilés JJ. The formation of cobalt silicide in two thermal stages. Proceedings. 1997 ;[citado 2026 mar. 02 ]
