Thioxanthone sensitized photodegradation of poly(alkyl methacrylate) films (2010)
Fonte: Journal of Applied Polymer Science. Unidade: IQSC
Assunto: FOTOQUÍMICA
ABNT
NEUMANN, Miguel Guillermo e CAVALHEIRO, Carla Cristina Schmitt e GOI, Beatriz Eleutério. Thioxanthone sensitized photodegradation of poly(alkyl methacrylate) films. Journal of Applied Polymer Science, v. 115, n. 3, p. 1283-1288, 2010Tradução . . Disponível em: https://doi.org/10.1002/app.30758. Acesso em: 31 out. 2024.APA
Neumann, M. G., Cavalheiro, C. C. S., & Goi, B. E. (2010). Thioxanthone sensitized photodegradation of poly(alkyl methacrylate) films. Journal of Applied Polymer Science, 115( 3), 1283-1288. doi:10.1002/app.30758NLM
Neumann MG, Cavalheiro CCS, Goi BE. Thioxanthone sensitized photodegradation of poly(alkyl methacrylate) films [Internet]. Journal of Applied Polymer Science. 2010 ; 115( 3): 1283-1288.[citado 2024 out. 31 ] Available from: https://doi.org/10.1002/app.30758Vancouver
Neumann MG, Cavalheiro CCS, Goi BE. Thioxanthone sensitized photodegradation of poly(alkyl methacrylate) films [Internet]. Journal of Applied Polymer Science. 2010 ; 115( 3): 1283-1288.[citado 2024 out. 31 ] Available from: https://doi.org/10.1002/app.30758