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Artigo de periodico
synthetic bilayer wetting on 'Si''O IND.2' surfaces (1998)
Salay, L C; Carmona-Ribeiro, Ana Maria
Source: Journal of Physical Chemistry. Unidade: IQ
Assunto: BIOQUÍMICA
A citação é gerada automaticamente e pode não estar totalmente de acordo com as normas
ABNT
SALAY, L C e CARMONA-RIBEIRO, Ana Maria. synthetic bilayer wetting on 'Si''O IND.2' surfaces. Journal of Physical Chemistry, v. 102, p. 4011-5, 1998Tradução . . Acesso em: 21 out. 2024.
APA
Salay, L. C., & Carmona-Ribeiro, A. M. (1998). synthetic bilayer wetting on 'Si''O IND.2' surfaces. Journal of Physical Chemistry, 102, 4011-5.
NLM
Salay LC, Carmona-Ribeiro AM. synthetic bilayer wetting on 'Si''O IND.2' surfaces. Journal of Physical Chemistry. 1998 ; 102 4011-5.[citado 2024 out. 21 ]
Vancouver
Salay LC, Carmona-Ribeiro AM. synthetic bilayer wetting on 'Si''O IND.2' surfaces. Journal of Physical Chemistry. 1998 ; 102 4011-5.[citado 2024 out. 21 ]
Trabalho de evento-resumo
Determination of contact angle as a tool to study adsorption of bilayer model membranes on silicon dioxide planar surfaces (1997)
Salay, L C; Carmona-Ribeiro, Ana Maria
Conference titles: Reunião Anual da Sociedade Brasileira de Bioquímica e Biologia Molecular. Unidade: IQ
Assunto: BIOQUÍMICA
A citação é gerada automaticamente e pode não estar totalmente de acordo com as normas
ABNT
SALAY, L C e CARMONA-RIBEIRO, Ana Maria. Determination of contact angle as a tool to study adsorption of bilayer model membranes on silicon dioxide planar surfaces. 1997, Anais.. São Paulo: SBBQ, 1997. . Acesso em: 21 out. 2024.
APA
Salay, L. C., & Carmona-Ribeiro, A. M. (1997). Determination of contact angle as a tool to study adsorption of bilayer model membranes on silicon dioxide planar surfaces. In . São Paulo: SBBQ.
NLM
Salay LC, Carmona-Ribeiro AM. Determination of contact angle as a tool to study adsorption of bilayer model membranes on silicon dioxide planar surfaces. 1997 ;[citado 2024 out. 21 ]
Vancouver
Salay LC, Carmona-Ribeiro AM. Determination of contact angle as a tool to study adsorption of bilayer model membranes on silicon dioxide planar surfaces. 1997 ;[citado 2024 out. 21 ]
Artigo de periodico
A Less critical cleaning procedure for silicon wafers using diluted hf dip and boiling in isopropil alcohol as final steps (1995)
Santos Filho, Sebastião Gomes dos ; Hasenack, Claus Martin; Salay, L C; Mertens, P W
Source: Journal of the Electrochemical Society. Unidade: EP
Assunto: CIRCUITOS INTEGRADOS
A citação é gerada automaticamente e pode não estar totalmente de acordo com as normas
ABNT
SANTOS FILHO, Sebastião Gomes dos et al. A Less critical cleaning procedure for silicon wafers using diluted hf dip and boiling in isopropil alcohol as final steps. Journal of the Electrochemical Society, v. 142, n. 3 , p. 902-7, 1995Tradução . . Disponível em: https://doi.org/10.1149/1.2048555. Acesso em: 21 out. 2024.
APA
Santos Filho, S. G. dos, Hasenack, C. M., Salay, L. C., & Mertens, P. W. (1995). A Less critical cleaning procedure for silicon wafers using diluted hf dip and boiling in isopropil alcohol as final steps. Journal of the Electrochemical Society, 142( 3 ), 902-7. doi:10.1149/1.2048555
NLM
Santos Filho SG dos, Hasenack CM, Salay LC, Mertens PW. A Less critical cleaning procedure for silicon wafers using diluted hf dip and boiling in isopropil alcohol as final steps [Internet]. Journal of the Electrochemical Society. 1995 ;142( 3 ): 902-7.[citado 2024 out. 21 ] Available from: https://doi.org/10.1149/1.2048555
Vancouver
Santos Filho SG dos, Hasenack CM, Salay LC, Mertens PW. A Less critical cleaning procedure for silicon wafers using diluted hf dip and boiling in isopropil alcohol as final steps [Internet]. Journal of the Electrochemical Society. 1995 ;142( 3 ): 902-7.[citado 2024 out. 21 ] Available from: https://doi.org/10.1149/1.2048555

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