Source: Journal of Non-Crystalline Solids. Conference titles: International Conference on Amorphous and Microcrystalline Semiconductors - Science and Technology. Unidade: IFSC
Assunto: FILMES FINOS
ABNT
CAPOTE, G. et al. Amorphous hydrogenated carbon films deposited by PECVD: influence of the substrate temperature on film growth and microstructure. Journal of Non-Crystalline Solids. Amsterdam: Elsevier Science. . Acesso em: 04 maio 2026. , 2004APA
Capote, G., Prioli, R., Jardim, P. M., Zanatta, A. R., Jacobsohn, L. G., & Freire Junior, F. L. (2004). Amorphous hydrogenated carbon films deposited by PECVD: influence of the substrate temperature on film growth and microstructure. Journal of Non-Crystalline Solids. Amsterdam: Elsevier Science.NLM
Capote G, Prioli R, Jardim PM, Zanatta AR, Jacobsohn LG, Freire Junior FL. Amorphous hydrogenated carbon films deposited by PECVD: influence of the substrate temperature on film growth and microstructure. Journal of Non-Crystalline Solids. 2004 ; 338/340( Ju 2004): 503-508.[citado 2026 maio 04 ]Vancouver
Capote G, Prioli R, Jardim PM, Zanatta AR, Jacobsohn LG, Freire Junior FL. Amorphous hydrogenated carbon films deposited by PECVD: influence of the substrate temperature on film growth and microstructure. Journal of Non-Crystalline Solids. 2004 ; 338/340( Ju 2004): 503-508.[citado 2026 maio 04 ]
