The influence of diffusion of fluorine compounds for silicon lateral etching (2004)
Source: Thin Solid Films,. Unidade: EP
Assunto: FILMES FINOS
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VERDONCK, Patrick Bernard e GOODYEAR, Alec e BRAITHWAITE, Nicholas. The influence of diffusion of fluorine compounds for silicon lateral etching. Thin Solid Films, v. 459, n. 1-2, p. 141-144, 2004Tradução . . Disponível em: https://doi.org/10.1016/j.tsf.2003.12.117. Acesso em: 27 abr. 2026.APA
Verdonck, P. B., Goodyear, A., & Braithwaite, N. (2004). The influence of diffusion of fluorine compounds for silicon lateral etching. Thin Solid Films,, 459( 1-2), 141-144. doi:10.1016/j.tsf.2003.12.117NLM
Verdonck PB, Goodyear A, Braithwaite N. The influence of diffusion of fluorine compounds for silicon lateral etching [Internet]. Thin Solid Films,. 2004 ; 459( 1-2): 141-144.[citado 2026 abr. 27 ] Available from: https://doi.org/10.1016/j.tsf.2003.12.117Vancouver
Verdonck PB, Goodyear A, Braithwaite N. The influence of diffusion of fluorine compounds for silicon lateral etching [Internet]. Thin Solid Films,. 2004 ; 459( 1-2): 141-144.[citado 2026 abr. 27 ] Available from: https://doi.org/10.1016/j.tsf.2003.12.117
