Study of excimer laser amorphous silicon film crystallization (1991)
Source: Journal of Non-Crystalline Solids. Unidade: EP
Assunto: SEMICONDUTORES
ABNT
BIANCONI, M et al. Study of excimer laser amorphous silicon film crystallization. Journal of Non-Crystalline Solids, v. 137-138, n. 1 , p. 725-8, 1991Tradução . . Disponível em: https://doi.org/10.1016/s0022-3093(05)80223-6. Acesso em: 06 nov. 2024.APA
Bianconi, M., Fonseca, F. J., Summonte, C., & Fortunato, G. (1991). Study of excimer laser amorphous silicon film crystallization. Journal of Non-Crystalline Solids, 137-138( 1 ), 725-8. doi:10.1016/s0022-3093(05)80223-6NLM
Bianconi M, Fonseca FJ, Summonte C, Fortunato G. Study of excimer laser amorphous silicon film crystallization [Internet]. Journal of Non-Crystalline Solids. 1991 ;137-138( 1 ): 725-8.[citado 2024 nov. 06 ] Available from: https://doi.org/10.1016/s0022-3093(05)80223-6Vancouver
Bianconi M, Fonseca FJ, Summonte C, Fortunato G. Study of excimer laser amorphous silicon film crystallization [Internet]. Journal of Non-Crystalline Solids. 1991 ;137-138( 1 ): 725-8.[citado 2024 nov. 06 ] Available from: https://doi.org/10.1016/s0022-3093(05)80223-6