Simple, safe, and economical microwave plasma -assisted chemical vapor deposition facility (1992)
Source: Review of Scientific Instruments. Unidade: IF
Assunto: FÍSICO-QUÍMICA
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BREWER, M A et al. Simple, safe, and economical microwave plasma -assisted chemical vapor deposition facility. Review of Scientific Instruments, v. 63, n. ju 1992, p. 3389-93, 1992Tradução . . Disponível em: https://doi.org/10.1063/1.1142557. Acesso em: 16 nov. 2024.APA
Brewer, M. A., Brown, I. G., Dickinson, M. R., Galvin, J. E., Macgill, R. A., & Salvadori, M. C. (1992). Simple, safe, and economical microwave plasma -assisted chemical vapor deposition facility. Review of Scientific Instruments, 63( ju 1992), 3389-93. doi:10.1063/1.1142557NLM
Brewer MA, Brown IG, Dickinson MR, Galvin JE, Macgill RA, Salvadori MC. Simple, safe, and economical microwave plasma -assisted chemical vapor deposition facility [Internet]. Review of Scientific Instruments. 1992 ;63( ju 1992): 3389-93.[citado 2024 nov. 16 ] Available from: https://doi.org/10.1063/1.1142557Vancouver
Brewer MA, Brown IG, Dickinson MR, Galvin JE, Macgill RA, Salvadori MC. Simple, safe, and economical microwave plasma -assisted chemical vapor deposition facility [Internet]. Review of Scientific Instruments. 1992 ;63( ju 1992): 3389-93.[citado 2024 nov. 16 ] Available from: https://doi.org/10.1063/1.1142557
