Simple, safe, and economical microwave plasma -assisted chemical vapor deposition facility

Simple, safe, and economical microwave plasma -assisted chemical vapor deposition facility (1992)

Authors:
USP affiliated author: SALVADORI, MARIA CECILIA BARBOSA DA S - IF
School: IF
DOI: 10.1063/1.1142557
Subject: FÍSICO-QUÍMICA
Language: Inglês
Imprenta:
- Place of publication: New York
- Date published: 1992
Source:
- Título do periódico: Review of Scientific Instruments
- Volume/Número/Paginação/Ano: v.63, n.6 , p.3389-93, jun. 1992

Informações sobre o DOI: 10.1063/1.1142557 (Fonte: oaDOI API)

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ABNT

BREWER, M A; BROWN, I G; DICKINSON, M R; et al. Simple, safe, and economical microwave plasma -assisted chemical vapor deposition facility. Review of Scientific Instruments, New York, v. 63, n. ju 1992, p. 3389-93, 1992. DOI: 10.1063/1.1142557.
APA

Brewer, M. A., Brown, I. G., Dickinson, M. R., Galvin, J. E., Macgill, R. A., & Salvadori, M. C. (1992). Simple, safe, and economical microwave plasma -assisted chemical vapor deposition facility. Review of Scientific Instruments, 63( ju 1992), 3389-93. doi:10.1063/1.1142557
NLM

Brewer MA, Brown IG, Dickinson MR, Galvin JE, Macgill RA, Salvadori MC. Simple, safe, and economical microwave plasma -assisted chemical vapor deposition facility. Review of Scientific Instruments. 1992 ;63( ju 1992): 3389-93.
Vancouver

Brewer MA, Brown IG, Dickinson MR, Galvin JE, Macgill RA, Salvadori MC. Simple, safe, and economical microwave plasma -assisted chemical vapor deposition facility. Review of Scientific Instruments. 1992 ;63( ju 1992): 3389-93.