High speed e-beam writing for large area photonic nanostructures: a choice of parameters (2016)
Fonte: Scientific Reports. Unidade: EESC
Assuntos: NANOTECNOLOGIA, ÓPTICA, FOTÔNICA, FEIXES ÓPTICOS, ENGENHARIA ELÉTRICA
ABNT
KEZHENG, Li et al. High speed e-beam writing for large area photonic nanostructures: a choice of parameters. Scientific Reports, n. 6, p. 1-10, 2016Tradução . . Disponível em: https://doi.org/10.1038/srep32945. Acesso em: 03 out. 2024.APA
Kezheng, L., Juntao, L., Reardon, C., Schuster, C., Yue, W., Triggs, G. J., et al. (2016). High speed e-beam writing for large area photonic nanostructures: a choice of parameters. Scientific Reports, ( 6), 1-10. doi:10.1038/srep32945NLM
Kezheng L, Juntao L, Reardon C, Schuster C, Yue W, Triggs GJ, Damnik N, Müenchenberger J, Xuehua W, Martins ER, Krauss TF. High speed e-beam writing for large area photonic nanostructures: a choice of parameters [Internet]. Scientific Reports. 2016 ;( 6): 1-10.[citado 2024 out. 03 ] Available from: https://doi.org/10.1038/srep32945Vancouver
Kezheng L, Juntao L, Reardon C, Schuster C, Yue W, Triggs GJ, Damnik N, Müenchenberger J, Xuehua W, Martins ER, Krauss TF. High speed e-beam writing for large area photonic nanostructures: a choice of parameters [Internet]. Scientific Reports. 2016 ;( 6): 1-10.[citado 2024 out. 03 ] Available from: https://doi.org/10.1038/srep32945