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Filtros : "SILÍCIO" "Itália" Removidos: "SERRA, OSVALDO ANTONIO" "TENÓRIO, JORGE ALBERTO SOARES" Limpar

Filtros

Artigo de periodico
Flow boiling of R134a and HFE-7000 in a single silicon microchannel with microstructured sidewalls (2021)
Bortolin, Stefano; Francescon, Andrea; Ribatski, Gherhardt ; Del Col, Davide
Source: International Journal of Heat and Mass Transfer. Unidade: EESC
Subjects: SILÍCIO, TRANSFERÊNCIA DE CALOR, PAREDES, ENGENHARIA MECÂNICA
A citação é gerada automaticamente e pode não estar totalmente de acordo com as normas
ABNT
BORTOLIN, Stefano et al. Flow boiling of R134a and HFE-7000 in a single silicon microchannel with microstructured sidewalls. International Journal of Heat and Mass Transfer, v. 179, p. 1-15, 2021Tradução . . Disponível em: https://doi.org/10.1016/j.ijheatmasstransfer.2021.121653. Acesso em: 07 nov. 2024.
APA
Bortolin, S., Francescon, A., Ribatski, G., & Del Col, D. (2021). Flow boiling of R134a and HFE-7000 in a single silicon microchannel with microstructured sidewalls. International Journal of Heat and Mass Transfer, 179, 1-15. doi:10.1016/j.ijheatmasstransfer.2021.121653
NLM
Bortolin S, Francescon A, Ribatski G, Del Col D. Flow boiling of R134a and HFE-7000 in a single silicon microchannel with microstructured sidewalls [Internet]. International Journal of Heat and Mass Transfer. 2021 ; 179 1-15.[citado 2024 nov. 07 ] Available from: https://doi.org/10.1016/j.ijheatmasstransfer.2021.121653
Vancouver
Bortolin S, Francescon A, Ribatski G, Del Col D. Flow boiling of R134a and HFE-7000 in a single silicon microchannel with microstructured sidewalls [Internet]. International Journal of Heat and Mass Transfer. 2021 ; 179 1-15.[citado 2024 nov. 07 ] Available from: https://doi.org/10.1016/j.ijheatmasstransfer.2021.121653
Artigo de periodico
(1011) preferential orientation of polycrystalline 'AL''N' grown on 'SI''O' IND. 2'/'SI' wafers by reactive sputter magnetron technique (2016)
Burgi, Juan; Garcia Molleja, Javier; Bolmaro, Raul; Piccoli, Mattia; Bemporad, Edoardo; Feugeas, Jorge; Craievich, Aldo Felix
Source: EUROPEAN PHYSICAL JOURNAL-APPLIED PHYSICS. Unidade: IF
Subjects: RAIOS X, SILÍCIO
A citação é gerada automaticamente e pode não estar totalmente de acordo com as normas
ABNT
BURGI, Juan et al. (1011) preferential orientation of polycrystalline 'AL''N' grown on 'SI''O' IND. 2'/'SI' wafers by reactive sputter magnetron technique. EUROPEAN PHYSICAL JOURNAL-APPLIED PHYSICS, v. 74, n. 1, p. 10301, 2016Tradução . . Disponível em: http://www.epjap.org/articles/epjap/abs/2016/04/ap150446/ap150446.html. Acesso em: 07 nov. 2024.
APA
Burgi, J., Garcia Molleja, J., Bolmaro, R., Piccoli, M., Bemporad, E., Feugeas, J., & Craievich, A. F. (2016). (1011) preferential orientation of polycrystalline 'AL''N' grown on 'SI''O' IND. 2'/'SI' wafers by reactive sputter magnetron technique. EUROPEAN PHYSICAL JOURNAL-APPLIED PHYSICS, 74( 1), 10301. doi:10.1051/epjap/2016150446
NLM
Burgi J, Garcia Molleja J, Bolmaro R, Piccoli M, Bemporad E, Feugeas J, Craievich AF. (1011) preferential orientation of polycrystalline 'AL''N' grown on 'SI''O' IND. 2'/'SI' wafers by reactive sputter magnetron technique [Internet]. EUROPEAN PHYSICAL JOURNAL-APPLIED PHYSICS. 2016 ; 74( 1): 10301.[citado 2024 nov. 07 ] Available from: http://www.epjap.org/articles/epjap/abs/2016/04/ap150446/ap150446.html
Vancouver
Burgi J, Garcia Molleja J, Bolmaro R, Piccoli M, Bemporad E, Feugeas J, Craievich AF. (1011) preferential orientation of polycrystalline 'AL''N' grown on 'SI''O' IND. 2'/'SI' wafers by reactive sputter magnetron technique [Internet]. EUROPEAN PHYSICAL JOURNAL-APPLIED PHYSICS. 2016 ; 74( 1): 10301.[citado 2024 nov. 07 ] Available from: http://www.epjap.org/articles/epjap/abs/2016/04/ap150446/ap150446.html

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