Optical constants and thickness determination of very thin amorphous semiconductor films (2002)
Chambouleyron, Ivan Emílio; Ventura, S. D.; Birgin, Ernesto Julian Goldberg 
; Martínez, José Mário
Source: Journal of Applied Physics. Unidade: IME
Subjects: ALGORITMOS, SEMICONDUTORES, DIELÉTRICOS
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CHAMBOULEYRON, Ivan Emílio et al. Optical constants and thickness determination of very thin amorphous semiconductor films. Journal of Applied Physics, v. 92, n. 6, p. 3093-3102, 2002Tradução . . Disponível em: https://doi.org/10.1063/1.1500785. Acesso em: 03 out. 2024.APA
Chambouleyron, I. E., Ventura, S. D., Birgin, E. J. G., & Martínez, J. M. (2002). Optical constants and thickness determination of very thin amorphous semiconductor films. Journal of Applied Physics, 92( 6), 3093-3102. doi:10.1063/1.1500785NLM
Chambouleyron IE, Ventura SD, Birgin EJG, Martínez JM. Optical constants and thickness determination of very thin amorphous semiconductor films [Internet]. Journal of Applied Physics. 2002 ; 92( 6): 3093-3102.[citado 2024 out. 03 ] Available from: https://doi.org/10.1063/1.1500785Vancouver
Chambouleyron IE, Ventura SD, Birgin EJG, Martínez JM. Optical constants and thickness determination of very thin amorphous semiconductor films [Internet]. Journal of Applied Physics. 2002 ; 92( 6): 3093-3102.[citado 2024 out. 03 ] Available from: https://doi.org/10.1063/1.1500785
