Source: Journal de Physique IV. Unidade: EP
Assunto: ENERGIA ELÉTRICA
ABNT
PAVANELLO, Marcelo Antonio e NICOLETT, Aparecido Sirley e MARTINO, João Antonio. Analysis of the substrate effect on enhancement mode SOInMOSFET effective channel length and series resistence extraction at 77K. Journal de Physique IV, v. 8, p. 49-52, 1998Tradução . . Disponível em: https://doi.org/10.1051/jp4:1998312. Acesso em: 14 nov. 2024.APA
Pavanello, M. A., Nicolett, A. S., & Martino, J. A. (1998). Analysis of the substrate effect on enhancement mode SOInMOSFET effective channel length and series resistence extraction at 77K. Journal de Physique IV, 8, 49-52. doi:10.1051/jp4:1998312NLM
Pavanello MA, Nicolett AS, Martino JA. Analysis of the substrate effect on enhancement mode SOInMOSFET effective channel length and series resistence extraction at 77K [Internet]. Journal de Physique IV. 1998 ;8 49-52.[citado 2024 nov. 14 ] Available from: https://doi.org/10.1051/jp4:1998312Vancouver
Pavanello MA, Nicolett AS, Martino JA. Analysis of the substrate effect on enhancement mode SOInMOSFET effective channel length and series resistence extraction at 77K [Internet]. Journal de Physique IV. 1998 ;8 49-52.[citado 2024 nov. 14 ] Available from: https://doi.org/10.1051/jp4:1998312