Cathodic behavior of co-sputtered Cu/V oxides thin films (2006)
Source: Electrochimica Acta. Unidade: IF
Subjects: FÍSICA NUCLEAR, FILMES FINOS, COBRE, VANÁDIO, ÍONS, ELETRODO
ABNT
SOUZA, E. A. et al. Cathodic behavior of co-sputtered Cu/V oxides thin films. Electrochimica Acta, v. 51, n. 26, p. 5885-5891, 2006Tradução . . Disponível em: https://doi.org/10.1016/j.electacta.2006.03.024. Acesso em: 14 out. 2024.APA
Souza, E. A., Landers, R., Tabacniks, M., Cardoso, L. P., & Gorenstein, A. (2006). Cathodic behavior of co-sputtered Cu/V oxides thin films. Electrochimica Acta, 51( 26), 5885-5891. doi:10.1016/j.electacta.2006.03.024NLM
Souza EA, Landers R, Tabacniks M, Cardoso LP, Gorenstein A. Cathodic behavior of co-sputtered Cu/V oxides thin films [Internet]. Electrochimica Acta. 2006 ; 51( 26): 5885-5891.[citado 2024 out. 14 ] Available from: https://doi.org/10.1016/j.electacta.2006.03.024Vancouver
Souza EA, Landers R, Tabacniks M, Cardoso LP, Gorenstein A. Cathodic behavior of co-sputtered Cu/V oxides thin films [Internet]. Electrochimica Acta. 2006 ; 51( 26): 5885-5891.[citado 2024 out. 14 ] Available from: https://doi.org/10.1016/j.electacta.2006.03.024