Deposition rate influence in O3 sensing response of sputtered ZnO thin films (2017)
Colmenares, Nathaly; Correr, Wagner Rafael; Mastelaro, Valmor Roberto 
Source: Proceedings. Conference titles: Eurosensors. Unidade: IFSC
Subjects: OZÔNIO, SENSOR, NANOCOMPOSITOS
A citação é gerada automaticamente e pode não estar totalmente de acordo com as normas
ABNT
COLMENARES, Nathaly e CORRER, Wagner Rafael e MASTELARO, Valmor Roberto. Deposition rate influence in O3 sensing response of sputtered ZnO thin films. Proceedings. Basel: MDPI AG. Disponível em: https://doi.org/10.3390/proceedings1040429. Acesso em: 10 nov. 2024. , 2017APA
Colmenares, N., Correr, W. R., & Mastelaro, V. R. (2017). Deposition rate influence in O3 sensing response of sputtered ZnO thin films. Proceedings. Basel: MDPI AG. doi:10.3390/proceedings1040429NLM
Colmenares N, Correr WR, Mastelaro VR. Deposition rate influence in O3 sensing response of sputtered ZnO thin films [Internet]. Proceedings. 2017 ; 1( 4): 429-1-429-4.[citado 2024 nov. 10 ] Available from: https://doi.org/10.3390/proceedings1040429Vancouver
Colmenares N, Correr WR, Mastelaro VR. Deposition rate influence in O3 sensing response of sputtered ZnO thin films [Internet]. Proceedings. 2017 ; 1( 4): 429-1-429-4.[citado 2024 nov. 10 ] Available from: https://doi.org/10.3390/proceedings1040429
