Source: Microelectronics Journal. Unidade: EP
Subjects: TITÂNIO, LIGAS NÃO FERROSAS
ABNT
GARZON, Carlos Mario et al. Hardness and structure characterization of Ti6Al4V films produced by reactive magnetron sputtering on a conventional austenitic stainless steel. Microelectronics Journal, v. 39, p. 1329-1330, 2008Tradução . . Disponível em: https://doi.org/10.1016/j.mejo.2008.01.047. Acesso em: 13 out. 2024.APA
Garzon, C. M., Alfonso Jose E,, Corredor, E. C., Recco, A. A. C., & Tschiptschin, A. P. (2008). Hardness and structure characterization of Ti6Al4V films produced by reactive magnetron sputtering on a conventional austenitic stainless steel. Microelectronics Journal, 39, 1329-1330. doi:10.1016/j.mejo.2008.01.047NLM
Garzon CM, Alfonso Jose E, Corredor EC, Recco AAC, Tschiptschin AP. Hardness and structure characterization of Ti6Al4V films produced by reactive magnetron sputtering on a conventional austenitic stainless steel [Internet]. Microelectronics Journal. 2008 ; 39 1329-1330.[citado 2024 out. 13 ] Available from: https://doi.org/10.1016/j.mejo.2008.01.047Vancouver
Garzon CM, Alfonso Jose E, Corredor EC, Recco AAC, Tschiptschin AP. Hardness and structure characterization of Ti6Al4V films produced by reactive magnetron sputtering on a conventional austenitic stainless steel [Internet]. Microelectronics Journal. 2008 ; 39 1329-1330.[citado 2024 out. 13 ] Available from: https://doi.org/10.1016/j.mejo.2008.01.047