Source: Journal of the Electrochemical Society. Unidade: IF
Assunto: FÍSICO-QUÍMICA
ABNT
PASSERINI, S et al. Radio-frequency reactively sputtered 'VO IND.X' thin films deposited at different oxygen flows. Journal of the Electrochemical Society, v. 145, n. 2, p. 706-711, 1998Tradução . . Acesso em: 02 out. 2024.APA
Passerini, S., Gorenstein, W. H., Fantini, M. C. de A., & Tabacniks, M. H. (1998). Radio-frequency reactively sputtered 'VO IND.X' thin films deposited at different oxygen flows. Journal of the Electrochemical Society, 145( 2), 706-711.NLM
Passerini S, Gorenstein WH, Fantini MC de A, Tabacniks MH. Radio-frequency reactively sputtered 'VO IND.X' thin films deposited at different oxygen flows. Journal of the Electrochemical Society. 1998 ; 145( 2): 706-711.[citado 2024 out. 02 ]Vancouver
Passerini S, Gorenstein WH, Fantini MC de A, Tabacniks MH. Radio-frequency reactively sputtered 'VO IND.X' thin films deposited at different oxygen flows. Journal of the Electrochemical Society. 1998 ; 145( 2): 706-711.[citado 2024 out. 02 ]