Two-photon lithography for integrated photonic packaging (2023)
Yu, Shaoliang 
; Du, Qingyang; Mendonça, Cleber Renato ; Ranno, Luigi ; Gu, Tian; Hu, Juejun
Source: Light: Advanced Manufacturing. Unidade: IFSC
Subjects: FOTÔNICA, ÓPTICA NÃO LINEAR, PROPRIEDADES DOS MATERIAIS
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ABNT
YU, Shaoliang et al. Two-photon lithography for integrated photonic packaging. Light: Advanced Manufacturing, v. No 2023, n. 32, p. 32-1-32-17, 2023Tradução . . Disponível em: https://doi.org/10.37188/lam.2023.032. Acesso em: 18 nov. 2024.APA
Yu, S., Du, Q., Mendonça, C. R., Ranno, L., Gu, T., & Hu, J. (2023). Two-photon lithography for integrated photonic packaging. Light: Advanced Manufacturing, No 2023( 32), 32-1-32-17. doi:10.37188/lam.2023.032NLM
Yu S, Du Q, Mendonça CR, Ranno L, Gu T, Hu J. Two-photon lithography for integrated photonic packaging [Internet]. Light: Advanced Manufacturing. 2023 ; No 2023( 32): 32-1-32-17.[citado 2024 nov. 18 ] Available from: https://doi.org/10.37188/lam.2023.032Vancouver
Yu S, Du Q, Mendonça CR, Ranno L, Gu T, Hu J. Two-photon lithography for integrated photonic packaging [Internet]. Light: Advanced Manufacturing. 2023 ; No 2023( 32): 32-1-32-17.[citado 2024 nov. 18 ] Available from: https://doi.org/10.37188/lam.2023.032
