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  • Artigo de periodico

    X-ray photoelectron spectroscopy analysis of zirconium nitride-like filmsprepared on Si(100) substrates by ion beam assisted deposition (2008)

    Matsuoka, Masao; Isotani, Sadao; Mamani, Wilmer Alexe Sucasaire; Kuratani, N; Ogata, K

    Source: Surface and Coatings Technology. Unidade: IF

    Subjects: FILMES FINOS, ESTRUTURA ELETRÔNICA

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    • ABNT

      MATSUOKA, Masao et al. X-ray photoelectron spectroscopy analysis of zirconium nitride-like filmsprepared on Si(100) substrates by ion beam assisted deposition. Surface and Coatings Technology, 2008Tradução . . Disponível em: https://doi.org/10.1016/j.surfcoat.2007.11.019. Acesso em: 12 out. 2024.

    • APA

      Matsuoka, M., Isotani, S., Mamani, W. A. S., Kuratani, N., & Ogata, K. (2008). X-ray photoelectron spectroscopy analysis of zirconium nitride-like filmsprepared on Si(100) substrates by ion beam assisted deposition. Surface and Coatings Technology. doi:10.1016/j.surfcoat.2007.11.019

    • NLM

      Matsuoka M, Isotani S, Mamani WAS, Kuratani N, Ogata K. X-ray photoelectron spectroscopy analysis of zirconium nitride-like filmsprepared on Si(100) substrates by ion beam assisted deposition [Internet]. Surface and Coatings Technology. 2008 ;[citado 2024 out. 12 ] Available from: https://doi.org/10.1016/j.surfcoat.2007.11.019

    • Vancouver

      Matsuoka M, Isotani S, Mamani WAS, Kuratani N, Ogata K. X-ray photoelectron spectroscopy analysis of zirconium nitride-like filmsprepared on Si(100) substrates by ion beam assisted deposition [Internet]. Surface and Coatings Technology. 2008 ;[citado 2024 out. 12 ] Available from: https://doi.org/10.1016/j.surfcoat.2007.11.019

  • Artigo de periodico

    Effects of arrival rate and gas pressure on the chemical bonding and composition in titanium nitride films prepared on Si(100) substrates by ion beam and vapor deposition (2005)

    Matsuoka, Masao; Isotani, Sadao; Mittani, Juan Carlos Ramirez; Chubaci, Jose Fernando Diniz; Ogata, K; Kuratani, N

    Source: Journal of Vacuum Science & Technology A. Unidade: IF

    Subjects: MATERIAIS, ESPECTROSCOPIA DE RAIO X, VÁCUO

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    • ABNT

      MATSUOKA, Masao et al. Effects of arrival rate and gas pressure on the chemical bonding and composition in titanium nitride films prepared on Si(100) substrates by ion beam and vapor deposition. Journal of Vacuum Science & Technology A, v. 23, n. 1, p. 137-141, 2005Tradução . . Disponível em: https://doi.org/10.1116/1.1839895. Acesso em: 12 out. 2024.

    • APA

      Matsuoka, M., Isotani, S., Mittani, J. C. R., Chubaci, J. F. D., Ogata, K., & Kuratani, N. (2005). Effects of arrival rate and gas pressure on the chemical bonding and composition in titanium nitride films prepared on Si(100) substrates by ion beam and vapor deposition. Journal of Vacuum Science & Technology A, 23( 1), 137-141. doi:10.1116/1.1839895

    • NLM

      Matsuoka M, Isotani S, Mittani JCR, Chubaci JFD, Ogata K, Kuratani N. Effects of arrival rate and gas pressure on the chemical bonding and composition in titanium nitride films prepared on Si(100) substrates by ion beam and vapor deposition [Internet]. Journal of Vacuum Science & Technology A. 2005 ; 23( 1): 137-141.[citado 2024 out. 12 ] Available from: https://doi.org/10.1116/1.1839895

    • Vancouver

      Matsuoka M, Isotani S, Mittani JCR, Chubaci JFD, Ogata K, Kuratani N. Effects of arrival rate and gas pressure on the chemical bonding and composition in titanium nitride films prepared on Si(100) substrates by ion beam and vapor deposition [Internet]. Journal of Vacuum Science & Technology A. 2005 ; 23( 1): 137-141.[citado 2024 out. 12 ] Available from: https://doi.org/10.1116/1.1839895

  • Artigo de periodico

    Influence of ion energy and arrival rate on x-ray crystallographic properties of thin Zr'O IND.X' films prepared on Si(111) substrate by ion-beam assisted deposition (2000)

    Matsuoka, Masao; Isotani, Sadao; Chubaci, Jose Fernando Diniz; Miyake, S; Setsuhara, Y; Ogata, K; Kuratani, N

    Source: Journal of Applied Physics. Unidade: IF

    Assunto: FÍSICA

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    • ABNT

      MATSUOKA, Masao et al. Influence of ion energy and arrival rate on x-ray crystallographic properties of thin Zr'O IND.X' films prepared on Si(111) substrate by ion-beam assisted deposition. Journal of Applied Physics, v. 88, n. 6, p. 3773-3775, 2000Tradução . . Disponível em: https://doi.org/10.1063/1.1286108. Acesso em: 12 out. 2024.

    • APA

      Matsuoka, M., Isotani, S., Chubaci, J. F. D., Miyake, S., Setsuhara, Y., Ogata, K., & Kuratani, N. (2000). Influence of ion energy and arrival rate on x-ray crystallographic properties of thin Zr'O IND.X' films prepared on Si(111) substrate by ion-beam assisted deposition. Journal of Applied Physics, 88( 6), 3773-3775. doi:10.1063/1.1286108

    • NLM

      Matsuoka M, Isotani S, Chubaci JFD, Miyake S, Setsuhara Y, Ogata K, Kuratani N. Influence of ion energy and arrival rate on x-ray crystallographic properties of thin Zr'O IND.X' films prepared on Si(111) substrate by ion-beam assisted deposition [Internet]. Journal of Applied Physics. 2000 ; 88( 6): 3773-3775.[citado 2024 out. 12 ] Available from: https://doi.org/10.1063/1.1286108

    • Vancouver

      Matsuoka M, Isotani S, Chubaci JFD, Miyake S, Setsuhara Y, Ogata K, Kuratani N. Influence of ion energy and arrival rate on x-ray crystallographic properties of thin Zr'O IND.X' films prepared on Si(111) substrate by ion-beam assisted deposition [Internet]. Journal of Applied Physics. 2000 ; 88( 6): 3773-3775.[citado 2024 out. 12 ] Available from: https://doi.org/10.1063/1.1286108

  • Artigo de periodico

    Properties of 'ZR'-n thin films prepared by the ion and vapour deposition method (1996)

    Matsuoka, Masao; Kuratani, N; Ogata, K

    Source: Journal of Materials Science Letters. Unidade: IF

    Assunto: MATÉRIA CONDENSADA

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    • ABNT

      MATSUOKA, Masao e KURATANI, N e OGATA, K. Properties of 'ZR'-n thin films prepared by the ion and vapour deposition method. Journal of Materials Science Letters, v. 15, p. 1340-2, 1996Tradução . . Disponível em: https://doi.org/10.1007/bf00240801. Acesso em: 12 out. 2024.

    • APA

      Matsuoka, M., Kuratani, N., & Ogata, K. (1996). Properties of 'ZR'-n thin films prepared by the ion and vapour deposition method. Journal of Materials Science Letters, 15, 1340-2. doi:10.1007/bf00240801

    • NLM

      Matsuoka M, Kuratani N, Ogata K. Properties of 'ZR'-n thin films prepared by the ion and vapour deposition method [Internet]. Journal of Materials Science Letters. 1996 ;15 1340-2.[citado 2024 out. 12 ] Available from: https://doi.org/10.1007/bf00240801

    • Vancouver

      Matsuoka M, Kuratani N, Ogata K. Properties of 'ZR'-n thin films prepared by the ion and vapour deposition method [Internet]. Journal of Materials Science Letters. 1996 ;15 1340-2.[citado 2024 out. 12 ] Available from: https://doi.org/10.1007/bf00240801

  • Artigo de periodico

    Effects of ion energy and arrival rate on the composition of zirconium oxide films prepared by ion-beam assisted deposition (1996)

    Matsuoka, Masao; Isotani, S; Miyake, S; Setsuhara, Y; Ogata, K; Kuratani, N

    Source: Journal of Applied Physics. Unidade: IF

    Assunto: MATÉRIA CONDENSADA

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    • ABNT

      MATSUOKA, Masao et al. Effects of ion energy and arrival rate on the composition of zirconium oxide films prepared by ion-beam assisted deposition. Journal of Applied Physics, v. 80, n. 2 , p. 1177, 1996Tradução . . Disponível em: https://doi.org/10.1063/1.362855. Acesso em: 12 out. 2024.

    • APA

      Matsuoka, M., Isotani, S., Miyake, S., Setsuhara, Y., Ogata, K., & Kuratani, N. (1996). Effects of ion energy and arrival rate on the composition of zirconium oxide films prepared by ion-beam assisted deposition. Journal of Applied Physics, 80( 2 ), 1177. doi:10.1063/1.362855

    • NLM

      Matsuoka M, Isotani S, Miyake S, Setsuhara Y, Ogata K, Kuratani N. Effects of ion energy and arrival rate on the composition of zirconium oxide films prepared by ion-beam assisted deposition [Internet]. Journal of Applied Physics. 1996 ;80( 2 ): 1177.[citado 2024 out. 12 ] Available from: https://doi.org/10.1063/1.362855

    • Vancouver

      Matsuoka M, Isotani S, Miyake S, Setsuhara Y, Ogata K, Kuratani N. Effects of ion energy and arrival rate on the composition of zirconium oxide films prepared by ion-beam assisted deposition [Internet]. Journal of Applied Physics. 1996 ;80( 2 ): 1177.[citado 2024 out. 12 ] Available from: https://doi.org/10.1063/1.362855
  • 1

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