Rivera, V. A. G.; Ferri, F. A.; Clabel H., J. L.; Kawamura, M. K.; Silva, Marcelo de Assumpção Pereira da 
; Nunes, Luiz Antônio de Oliveira ; Siu Li, Máximo ; Marega Junior, Euclydes
Source: Proceedings of SPIE. Conference titles: Optical Components and Materials. Unidade: IFSC
Subjects: FILMES FINOS, ESPECTROSCOPIA, TERRAS RARAS
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RIVERA, V. A. G. et al. High near-infrared emission intensity of Er3+-doped zirconium oxide films on a Si(100) substrate. Proceedings of SPIE. Bellingham: International Society for Optical Engineering - SPIE. Disponível em: https://doi.org/10.1117/12.2004783. Acesso em: 09 nov. 2024. , 2013APA
Rivera, V. A. G., Ferri, F. A., Clabel H., J. L., Kawamura, M. K., Silva, M. de A. P. da, Nunes, L. A. de O., et al. (2013). High near-infrared emission intensity of Er3+-doped zirconium oxide films on a Si(100) substrate. Proceedings of SPIE. Bellingham: International Society for Optical Engineering - SPIE. doi:10.1117/12.2004783NLM
Rivera VAG, Ferri FA, Clabel H. JL, Kawamura MK, Silva M de AP da, Nunes LA de O, Siu Li M, Marega Junior E. High near-infrared emission intensity of Er3+-doped zirconium oxide films on a Si(100) substrate [Internet]. Proceedings of SPIE. 2013 ; 8621 86211K-1-86211K-9.[citado 2024 nov. 09 ] Available from: https://doi.org/10.1117/12.2004783Vancouver
Rivera VAG, Ferri FA, Clabel H. JL, Kawamura MK, Silva M de AP da, Nunes LA de O, Siu Li M, Marega Junior E. High near-infrared emission intensity of Er3+-doped zirconium oxide films on a Si(100) substrate [Internet]. Proceedings of SPIE. 2013 ; 8621 86211K-1-86211K-9.[citado 2024 nov. 09 ] Available from: https://doi.org/10.1117/12.2004783
